发明申请
US20070259110A1 PLASMA, UV AND ION/NEUTRAL ASSISTED ALD OR CVD IN A BATCH TOOL
有权
等离子体，紫外线和离子/中性辅助ALD或CVD在批量工具中
- 专利标题： PLASMA, UV AND ION/NEUTRAL ASSISTED ALD OR CVD IN A BATCH TOOL
- 专利标题（中）： 等离子体，紫外线和离子/中性辅助ALD或CVD在批量工具中
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申请号： US11381970申请日： 2006-05-05
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公开(公告)号： US20070259110A1公开(公告)日： 2007-11-08
- 发明人: Maitreyee Mahajani , Joseph Yudovsky , Brendan McDougall
- 申请人： Maitreyee Mahajani , Joseph Yudovsky , Brendan McDougall
- 专利权人： APPLIED MATERIALS, INC.
- 当前专利权人： APPLIED MATERIALS, INC.
- 主分类号： C23C16/00
- IPC分类号： C23C16/00 ; H05H1/24
摘要：
A batch processing chamber includes a chamber housing, a substrate boat for containing a batch of substrates in a process region, and an excitation assembly for exciting species of a processing gas. The excitation assembly is positioned within the chamber housing and may include plasma, UV, or ion assistance.
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