发明申请
- 专利标题： IMPRINT LITHOGRAPHY SYSTEM TO PRODUCE LIGHT TO IMPINGE UPON AND POLYMERIZE A LIQUID IN SUPERIMPOSITION WITH TEMPLATE OVERLAY MARKS
- 专利标题（中）： 印刷光刻系统，用于生产光以引入和聚合液体在超模中与模板覆盖标记
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申请号： US10864214申请日： 2004-06-09
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公开(公告)号： US20070264588A1公开(公告)日： 2007-11-15
- 发明人: Sidlgata Sreenivasan , Byung-Jin Choi , Matthew Colburn , Todd Bailey
- 申请人： Sidlgata Sreenivasan , Byung-Jin Choi , Matthew Colburn , Todd Bailey
- 申请人地址： US TX Austin
- 专利权人： Board of Regents, The University of Texas System
- 当前专利权人： Board of Regents, The University of Texas System
- 当前专利权人地址： US TX Austin
- 主分类号： G03C5/00
- IPC分类号： G03C5/00 ; B29C35/08
摘要：
The present invention includes an imprint lithography system for impinging a flux of light upon a liquid to polymerize the liquid, the system including, a source of light producing the flux of light; and a template having overlay marks being disposed between the liquid and the source of light and being opaque to the flux of light, with a pitch of the overlay marks establishing a polarization of the flux of light such that the flux of light impinges upon and polymerizes the liquid in superimposition with the overlay marks.
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