发明申请
- 专利标题： Electrolytic Processing Apparatus and Electrolytic Processing Method
- 专利标题（中）： 电解处理装置及电解处理方法
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申请号： US10560623申请日： 2004-07-14
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公开(公告)号： US20070272562A1公开(公告)日： 2007-11-29
- 发明人: Ikutaro Noji , Hozumi Yasuda , Takeshi Iizumi , Kazuto Hirokawa , Itsuki Kobata
- 申请人： Ikutaro Noji , Hozumi Yasuda , Takeshi Iizumi , Kazuto Hirokawa , Itsuki Kobata
- 优先权： JP2003-197408 20030715; JP2004-007123 20040114
- 国际申请： PCT/JP04/10362 WO 20040714
- 主分类号： H01L21/3063
- IPC分类号： H01L21/3063
摘要：
The present invention provides an electrolytic processing apparatus and an electrolytic processing method which can effectively prevent the formation of pits that would impair the quality of the processed product. The electrolytic processing apparatus including: a processing electrode (210) for processing a workpiece; a feeding electrode (212) for feeding electricity to the workpiece; a power source (232) for applying a voltage between the processing electrode (210) and the feeding electrode (212); a pressure tight container (200) housing the processing electrode (210) and the feeding electrode (212) therein; and a high-pressure liquid supply system (204) for supplying a high-pressure liquid into the pressure tight container (210).
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