发明申请
- 专利标题: Charged particle beam apparatus and method for charged particle beam adjustment
- 专利标题(中): 带电粒子束装置和带电粒子束调整方法
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申请号: US11715506申请日: 2007-03-08
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公开(公告)号: US20070284542A1公开(公告)日: 2007-12-13
- 发明人: Takeshi Ogashiwa , Mitsugu Sato , Atsushi Takane , Toshihide Agemura , Yuusuke Narita , Takeharu Shichiji , Shinichi Tomita , Sukehiro Ito , Junichi Katane
- 申请人: Takeshi Ogashiwa , Mitsugu Sato , Atsushi Takane , Toshihide Agemura , Yuusuke Narita , Takeharu Shichiji , Shinichi Tomita , Sukehiro Ito , Junichi Katane
- 优先权: JP2006-061980 20060308; JP2006-235871 20060831
- 主分类号: G01N21/00
- IPC分类号: G01N21/00
摘要:
A charged particle beam apparatus facilitating adjusting the beam center axis of a charged particle beam in a case where optical conditions are modified or in a case where the beam center axis of the charged particle beam is moved due to state variation of the apparatus. When the beam center axis of a primary charged particle beam is adjusted with a deflector (aligner), a processing step (1) for measuring the sensitivity of the aligner and a processing step (2) for detecting the deviation between the center of the primary charged particle beam and the center of the objective aperture are provided. The charged particle beam apparatus has means for determining the aligner set values, using the aligner sensitivity measured in the processing step (1) and the amount of deviation detected in the processing step (2), such that the primary charged particle beam passes through the center of the objective aperture and controlling the aligner using the aligner set values.
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