- 专利标题： Sensor for use in a lithographic apparatus
-
申请号： US11896981申请日： 2007-09-07
-
公开(公告)号： US20080007844A1公开(公告)日： 2008-01-10
- 发明人: Haico Kok , Marcus Van De Kerhof , Borgert Kruizinga , Timotheus Sengers , Bearrach Moest , Marc Haast , Peter Weissbrodt , Manfred Schrenk , Torsten Harzendorf
- 申请人： Haico Kok , Marcus Van De Kerhof , Borgert Kruizinga , Timotheus Sengers , Bearrach Moest , Marc Haast , Peter Weissbrodt , Manfred Schrenk , Torsten Harzendorf
- 申请人地址： NL Veldhoven
- 专利权人： ASML Netherlands B.V.
- 当前专利权人： ASML Netherlands B.V.
- 当前专利权人地址： NL Veldhoven
- 主分类号： G02B3/08
- IPC分类号： G02B3/08
摘要：
A sensor for use at substrate level in a high numerical aperature lithographic apparatus, the sensor having a transparent plate that covers a sensing element and includes elements that improve coupling of radiation into the sensing element. The elements include Fresnel lenses, holographic optical elements, inverted Winston Cones, spherical lenses and surface roughening.
公开/授权文献
- US07453078B2 Sensor for use in a lithographic apparatus 公开/授权日：2008-11-18
信息查询
