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公开(公告)号：US20080007844A1
公开(公告)日：2008-01-10
申请号：US11896981
申请日：2007-09-07
申请人： Haico Kok , Marcus Van De Kerhof , Borgert Kruizinga , Timotheus Sengers , Bearrach Moest , Marc Haast , Peter Weissbrodt , Manfred Schrenk , Torsten Harzendorf
发明人： Haico Kok , Marcus Van De Kerhof , Borgert Kruizinga , Timotheus Sengers , Bearrach Moest , Marc Haast , Peter Weissbrodt , Manfred Schrenk , Torsten Harzendorf
IPC分类号： G02B3/08
CPC分类号： G03F7/7085
摘要： A sensor for use at substrate level in a high numerical aperature lithographic apparatus, the sensor having a transparent plate that covers a sensing element and includes elements that improve coupling of radiation into the sensing element. The elements include Fresnel lenses, holographic optical elements, inverted Winston Cones, spherical lenses and surface roughening.
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公开(公告)号：US20060192093A1
公开(公告)日：2006-08-31
申请号：US11067491
申请日：2005-02-28
申请人： Haico Kok , Marcus Van De Kerhof , Borgert Kruizinga , Timotheus Sengers , Bearrach Moest , Marc Haast , Peter Weissbrodt , Manfred Schrenk , Torsten Harzendorf
发明人： Haico Kok , Marcus Van De Kerhof , Borgert Kruizinga , Timotheus Sengers , Bearrach Moest , Marc Haast , Peter Weissbrodt , Manfred Schrenk , Torsten Harzendorf
CPC分类号： G03F7/7085
摘要： A sensor for use at substrate level in a high numerical aperature lithographic apparatus, the sensor having a transparent plate that covers a sensing element and includes elements that improve coupling of radiation into the sensing element. The elements include Fresnel lenses, holographic optical elements, inverted Winston Cones, spherical lenses and surface roughening.
摘要翻译： 一种用于高数值温度光刻设备中的衬底级别的传感器，该传感器具有覆盖感测元件的透明板，并且包括改善辐射与感测元件的耦合的元件。 元件包括菲涅尔透镜，全息光学元件，倒置的温斯顿锥体，球面透镜和表面粗糙化。
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公开(公告)号：US20070108377A1
公开(公告)日：2007-05-17
申请号：US11591674
申请日：2006-11-02
申请人： Haico Kok , Marcus Van De Kerkhof , Borgert Kruizinga , Timotheus Sengers , Bearrach Moest , Marc Antonius Haast , Peter Weissbrodt , Manfred Helmut Gustav Schrenk , Torsten Harzendorf
发明人： Haico Kok , Marcus Van De Kerkhof , Borgert Kruizinga , Timotheus Sengers , Bearrach Moest , Marc Antonius Haast , Peter Weissbrodt , Manfred Helmut Gustav Schrenk , Torsten Harzendorf
CPC分类号： G03F7/7085
摘要： A sensor for use at substrate level in a high numerical aperture lithographic apparatus, the sensor having a transparent plate that covers a sensing element and includes elements that improve coupling of radiation into the sensing element. The improved coupling elements include a flowing liquid medium disposed between the transparent plate and the sensing element.
摘要翻译： 一种用于高数值孔径光刻设备中的衬底级别的传感器，该传感器具有覆盖感测元件的透明板，并且包括改善辐射与感测元件的耦合的元件。 改进的耦合元件包括设置在透明板和感测元件之间的流动液体介质。
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公开(公告)号：US20070139629A1
公开(公告)日：2007-06-21
申请号：US11312660
申请日：2005-12-21
申请人： Timotheus Sengers , Nicolaas Johannes Van Asten , Wilhelmus Box , Tjarko Van Empel , Leon Levasier , Erik Loopstra , Marcel Hubertus Muitjens , Luberthus Ouwehand , Leon Van Den Schoor , Marcel Beckers , Rob Jansen , Elke Van Loenhout
发明人： Timotheus Sengers , Nicolaas Johannes Van Asten , Wilhelmus Box , Tjarko Van Empel , Leon Levasier , Erik Loopstra , Marcel Hubertus Muitjens , Luberthus Ouwehand , Leon Van Den Schoor , Marcel Beckers , Rob Jansen , Elke Van Loenhout
IPC分类号： G03B27/42
CPC分类号： G03F7/70883 , G03F7/7075 , G03F7/70858 , G03F9/7011 , G03F9/7034
摘要： A lithographic apparatus is disclosed. The apparatus includes a substrate table constructed to hold a substrate. The substrate table is moveable to transfer the substrate between a substrate measuring position and a substrate processing position. The apparatus also includes a measuring system configured to measure at least one aspect or characteristic of the substrate when the substrate table holds the substrate in the measuring position. The measuring system is configured to direct at least one measuring beam and/or field towards a surface of the substrate. A projection system is configured to project a patterned radiation beam onto a target portion of the substrate when the substrate table holds the substrate in the substrate processing position, and a conditioning system is configured to supply a conditioning fluid to at least part of a path of the measuring beam and/or field of the measuring system to condition the part of the path.
摘要翻译： 公开了一种光刻设备。 该装置包括构造成保持基板的基板台。 衬底台可移动以在衬底测量位置和衬底处理位置之间传送衬底。 该装置还包括测量系统，其被配置为当衬底台将衬底保持在测量位置时，测量衬底的至少一个方面或特征。 测量系统被配置为将至少一个测量光束和/或场朝向衬底的表面引导。 投影系统被配置为当衬底台将衬底保持在衬底处理位置时将图案化的辐射束投射到衬底的目标部分上，并且调节系统被配置为将调节流体提供给至少部分路径 测量系统的测量光束和/或场来调节路径的一部分。
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公开(公告)号：US20070041001A1
公开(公告)日：2007-02-22
申请号：US11499855
申请日：2006-08-07
IPC分类号： G03B27/42
CPC分类号： G03F7/70341 , G03F7/70616
摘要： A lithographic projection apparatus in which a liquid supply system and the geometry of the objects on the substrate table are arranged to avoid high velocity immersion liquid flowing over sensors.
摘要翻译： 一种光刻投影装置，其中液体供应系统和基板上的物体的几何形状被布置以避免流过传感器的高速浸没液体。
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公开(公告)号：US20070268471A1
公开(公告)日：2007-11-22
申请号：US11710408
申请日：2007-02-26
申请人： Joeri Lof , Hans Butler , Sjoerd Donders , Aleksey Kolesnychenko , Erik Loopstra , Hendricus Meijer , Jeroen Johannes Mertens , Johannes Mulkens , Roelof Ritsema , Frank Schaik , Timotheus Sengers , Klaus Simon , Joannes De Smit , Alexander Straaijer , Helmar Santen
发明人： Joeri Lof , Hans Butler , Sjoerd Donders , Aleksey Kolesnychenko , Erik Loopstra , Hendricus Meijer , Jeroen Johannes Mertens , Johannes Mulkens , Roelof Ritsema , Frank Schaik , Timotheus Sengers , Klaus Simon , Joannes De Smit , Alexander Straaijer , Helmar Santen
IPC分类号： G03B27/42
CPC分类号： G03F7/70341 , G03F7/707 , G03F7/7085 , G03F7/70866
摘要： A lithographic projection apparatus is disclosed in which a space between the projection system and the substrate is filled with a liquid. An edge seal member at least partly surrounds the substrate or other object on a substrate table to prevent liquid loss when edge portions of the substrate or other object are, for example, imaged or illuminated.
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公开(公告)号：US20070132979A1
公开(公告)日：2007-06-14
申请号：US11482122
申请日：2006-07-07
申请人： Joeri Lof , Erik Maria Bijlaart , Roelof Aeilko Ritsema , Frank Schaik , Timotheus Sengers , Klaus Simon , Joannes De Smit , Arie Den Boef , Hans Butler , Sjoerd Lambertus Donders , Christiaan Hoogendam , Marcus Van De Kerkhof , Aleksey Kolesnychenko , Mark Kroon , Erik Loopstra , Hendricus Maria Meijer , Jeroen Sophia Maria Mertens , Johannes Hubertus Mulkens , Joost Ottens , Alexander Straaijer , Bob Streefkerk , Helmar Santen
发明人： Joeri Lof , Erik Maria Bijlaart , Roelof Aeilko Ritsema , Frank Schaik , Timotheus Sengers , Klaus Simon , Joannes De Smit , Arie Den Boef , Hans Butler , Sjoerd Lambertus Donders , Christiaan Hoogendam , Marcus Van De Kerkhof , Aleksey Kolesnychenko , Mark Kroon , Erik Loopstra , Hendricus Maria Meijer , Jeroen Sophia Maria Mertens , Johannes Hubertus Mulkens , Joost Ottens , Alexander Straaijer , Bob Streefkerk , Helmar Santen
IPC分类号： G03B27/72
CPC分类号： G03F7/70141 , G03F7/70341 , G03F7/7085 , G03F7/70883
摘要： A lithographic projection apparatus is disclosed in which a space between the projection system and a sensor is filled with a liquid.
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公开(公告)号：US20070132971A1
公开(公告)日：2007-06-14
申请号：US11482119
申请日：2006-07-07
IPC分类号： G03B27/42
CPC分类号： G03F7/70775 , G03F7/70058 , G03F7/70191 , G03F7/70341 , G03F7/7055 , G03F7/707 , G03F7/7085 , G03F9/7088
摘要： A lithographic apparatus is provided that has a sensor at substrate level, the sensor including a radiation receiver, a transmissive plate supporting the radiation receiver, and a radiation detector, wherein the sensor is arranged to avoid loss of radiation between the radiation receiver and a final element of the radiation detector.
摘要翻译： 提供了一种光刻设备，其具有在基底水平的传感器，所述传感器包括辐射接收器，支撑辐射接收器的透射板和辐射探测器，其中所述传感器布置成避免辐射接收器与最终的辐射之间的辐射损失 辐射探测器的元件。
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公开(公告)号：US20070013890A1
公开(公告)日：2007-01-18
申请号：US11445466
申请日：2006-06-02
申请人： Erik Loopstra , Arno Bleeker , Heine Mulder , Oscar Franciscus Noordman , Timotheus Sengers , Laurentius Jorritsma , Mark Trentelman , Gerrit Streutker
发明人： Erik Loopstra , Arno Bleeker , Heine Mulder , Oscar Franciscus Noordman , Timotheus Sengers , Laurentius Jorritsma , Mark Trentelman , Gerrit Streutker
IPC分类号： G03B27/72
CPC分类号： G03F7/70733 , G03F7/70208 , G03F7/70283 , G03F7/70466
摘要： In order to improve the productivity of a lithographic apparatus, a stage apparatus for holding two patterning devices is described. The patterning devices are arranged such that the distance between the patterns in the scanning direction corresponds to the length of the pattern in the scanning direction. By doing so, an improved exposure sequence may be performed by exposing a first die with a first pattern, skipping a second die adjacent to the first die, and exposing a third die adjacent to the second die using a second pattern.
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公开(公告)号：US20060176458A1
公开(公告)日：2006-08-10
申请号：US11375039
申请日：2006-03-15
申请人： Antonius Maria Derksen , Sjoerd Donders , Christiaan Hoogendam , Joeri Lof , Erik Loopstra , Jeroen Maria Mertens , Johannes Mulkens , Timotheus Sengers , Alexander Straaijer , Bob Streefkerk
发明人： Antonius Maria Derksen , Sjoerd Donders , Christiaan Hoogendam , Joeri Lof , Erik Loopstra , Jeroen Maria Mertens , Johannes Mulkens , Timotheus Sengers , Alexander Straaijer , Bob Streefkerk
IPC分类号： G03B27/42
CPC分类号： G03F7/707 , G03F7/70341 , G03F7/70833 , G03F7/7085 , G03F7/70916 , G03F9/7088
摘要： In a lithographic projection apparatus, a liquid supply system provides liquid in a space between the final element of the projection system and the substrate of the lithographic projection apparatus. A shutter member is provided to contain liquid in the liquid supply system during, for example, substrate exchange.
摘要翻译： 在光刻投影设备中，液体供应系统在投影系统的最终元件和光刻投影设备的基板之间的空间中提供液体。 提供挡板构件以在例如基板交换期间容纳液体供应系统中的液体。
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