发明申请
- 专利标题: Buried pattern substrate and manufacturing method thereof
- 专利标题(中): 埋地图案基板及其制造方法
-
申请号: US11708339申请日: 2007-02-21
-
公开(公告)号: US20080009128A1公开(公告)日: 2008-01-10
- 发明人: Shuhichi Okabe , Myung-Sam Kang , Jung-Hyun Park , Hoe-Ku Jung , Ji-Eun Kim
- 申请人: Shuhichi Okabe , Myung-Sam Kang , Jung-Hyun Park , Hoe-Ku Jung , Ji-Eun Kim
- 申请人地址: KR Suwon
- 专利权人: SAMSUNG ELECTRO-MECHANICS CO., LTD.
- 当前专利权人: SAMSUNG ELECTRO-MECHANICS CO., LTD.
- 当前专利权人地址: KR Suwon
- 优先权: KR10-2006-0063637 20060706
- 主分类号: H01L21/44
- IPC分类号: H01L21/44
摘要:
A buried pattern substrate and a manufacturing method thereof are disclosed. A method of manufacturing a buried pattern substrate having a circuit pattern formed on a surface, in which the circuit pattern is connected electrically by a stud bump, includes (a) forming the circuit pattern and the stud bump by depositing a plating layer selectively on a seed layer of a carrier film, where the seed layer is laminated on a surface of the carrier film, (b) laminating and pressing the carrier film on an insulation layer such that the circuit pattern and the stud bump face the insulation layer, and (c) removing the carrier film and the seed layer, allows the circuit interconnection to be realized using a copper (Cu) stud bump, so that a drilling process for interconnection is unnecessary, the degree of freedom for circuit design is improved, a via land is made unnecessary and the size of a via is small, to allow higher density in a circuit.
信息查询
IPC分类: