发明申请
- 专利标题: Apparatus and Method for Forming an Alignment Layer
- 专利标题(中): 用于形成对准层的装置和方法
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申请号: US11566716申请日: 2006-12-05
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公开(公告)号: US20080011969A1公开(公告)日: 2008-01-17
- 发明人: Johji Nakagaki , Akihiro Asahara , Hideo Kimura , Hiroaki Kitahara , Tatsuya Nishiwaki , Yasuhiko Shiota , Takeshi Yamada
- 申请人: Johji Nakagaki , Akihiro Asahara , Hideo Kimura , Hiroaki Kitahara , Tatsuya Nishiwaki , Yasuhiko Shiota , Takeshi Yamada
- 申请人地址: US NY Armonk 10504
- 专利权人: INTERNATIONAL BUSINESS MACHINES CORPORATION
- 当前专利权人: INTERNATIONAL BUSINESS MACHINES CORPORATION
- 当前专利权人地址: US NY Armonk 10504
- 优先权: JP2005-358324 20051212
- 主分类号: G21G5/00
- IPC分类号: G21G5/00
摘要:
An apparatus and method for forming an alignment layer with uniform orientation is provided. An alignment layer-forming apparatus includes an ion source for generating ion beams and one or more masks disposed between the ion source and a substrate. The masks each have a reflective face directed to the substrate. The ion beams are reflected between the reflective face of each mask and a thin-film which is disposed on the substrate and which is processed into an alignment layer, whereby the alignment layer is formed with the ion beam finally applied to the thin-film. The orientation of a liquid crystal can be rendered uniform by varying the shape and/or arrangement of the reflective face of the mask. Hence, a liquid crystal display with no brightness or color non-uniformity can be manufactured.
公开/授权文献
- US07525107B2 Apparatus and method for forming an alignment layer 公开/授权日:2009-04-28
信息查询
IPC分类:
G | 物理 |
G21 | 核物理;核工程 |
G21G | 化学元素的转变;放射源 |
G21G5/00 | 通过化学反应进行化学元素的推断转变 |