Invention Application
US20080014712A1 METHOD FOR DIRECT BONDING TWO SEMICONDUCTOR SUBSTRATES 有权
用于直接结合两个半导体衬底的方法

METHOD FOR DIRECT BONDING TWO SEMICONDUCTOR SUBSTRATES
Abstract:
The invention provides methods of direct bonding substrates at least one of which includes a layer of semiconductor material that extends over its front face or in the proximity thereof. The provided methods include, prior to bonding, subjecting the bonding face of at least one substrate comprising a semiconductor material to selected heat treatment at a selected temperature and in a selected gaseous atmosphere. The bonded substrates are useful for electronic, optic, or optoelectronic applications.
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