发明申请
US20080028360A1 Methods and systems for performing lithography, methods for aligning objects relative to one another, and nanoimprinting molds having non-marking alignment features
审中-公开
用于执行光刻的方法和系统，用于将物体相对于彼此对准的方法以及具有非标记对准特征的纳米压印模具
- 专利标题： Methods and systems for performing lithography, methods for aligning objects relative to one another, and nanoimprinting molds having non-marking alignment features
- 专利标题（中）： 用于执行光刻的方法和系统，用于将物体相对于彼此对准的方法以及具有非标记对准特征的纳米压印模具
-
申请号： US11496368申请日： 2006-07-31
-
公开(公告)号： US20080028360A1公开(公告)日： 2008-01-31
- 发明人: Carl E. Picciotto , Jun Gao , Wei Wu , Zhaoning Yu
- 申请人： Carl E. Picciotto , Jun Gao , Wei Wu , Zhaoning Yu
- 主分类号： G06F17/50
- IPC分类号： G06F17/50 ; G03F9/00
摘要：
Methods of performing lithography include calculating a displacement vector for a lithography tool using an image of a portion of the lithography tool and a portion of a substrate and an additional image of a portion of an additional lithography tool and a portion of the substrate. Methods of aligning objects include positioning a second object proximate a first object and acquiring a first image illustrating a feature on a surface of the second object and a feature on a surface of the first object. An additional object is positioned proximate the first object, and an additional image is acquired that illustrates a feature on a surface of the additional object and the feature on the surface of the first object. The additional image is compared with the first image. Imprint molds include at least one non-marking reference feature on an imprinting surface of a mode base.
信息查询
