Invention Application
US20080030152A1 Boron Nitride Thin-Film Emitter and Production Method Thereof, and Electron Emitting Method Using Boron Nitride Thin-Film Emitter 失效
氮化硼薄膜发射体及其制造方法以及使用氮化硼薄膜发射体的电子发射方法

Boron Nitride Thin-Film Emitter and Production Method Thereof, and Electron Emitting Method Using Boron Nitride Thin-Film Emitter
Abstract:
Based on designs concerning boron nitride thin-films each including boron nitride crystals in acute-ended shapes excellent in field electron emission properties, and designs of emitters adopting such thin-films, it is aimed at appropriately controlling a distribution state of such crystals to thereby provide an emitter having an excellent efficiency and thus requiring only a lower threshold electric field for electron emission. In a design of a boron nitride thin-film emitter comprising crystals that are each represented by a general formula BN, that each include sp3 bonded boron nitride, sp2 bonded boron nitride, or a mixture thereof, and that each exhibit an acute-ended shape excellent in field electron emission property; there is controlled an angle of a substrate relative to a reaction gas flow upon deposition of the emitter from a vapor phase, thereby controlling a distribution state of the crystals over a surface of the thin-film.
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