发明申请
- 专利标题: Method For Structuring A Substrate Using Multiple Exposure
- 专利标题(中): 使用多重曝光构造基板的方法
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申请号: US11547909申请日: 2005-04-11
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公开(公告)号: US20080036982A1公开(公告)日: 2008-02-14
- 发明人: Ulrich Wegmann , Gerd Reisinger , Manfred Maul , Paul Graeupner , Martin Schriever , Aksel Goehnermeier
- 申请人: Ulrich Wegmann , Gerd Reisinger , Manfred Maul , Paul Graeupner , Martin Schriever , Aksel Goehnermeier
- 专利权人: CARL ZEISS SMT AG
- 当前专利权人: CARL ZEISS SMT AG
- 优先权: DE102004020983.9 20040423
- 国际申请: PCT/EP05/03780 WO 20050411
- 主分类号: G03B27/42
- IPC分类号: G03B27/42 ; G03B27/52
摘要:
1. Method for patterning a substrate using multiple exposure.2.1. The invention relates to a method for patterning a substrate using exposure processes of an adjustable optical system, a multiple exposure being used for producing a structure image on the substrate.2.2. According to the invention, for at least one of the plurality of exposures, the imaging quality of the optical system is determined by means of a respective measurement step and at least one parameter of the optical system that influences the imaging quality is set depending on this.2.3. Use e.g. for the patterning of semiconductor wafers in microlithography projection exposure apparatuses.