发明申请
- 专利标题： RETAINING RING WITH CONDUCTIVE PORTION
- 专利标题（中）： 带导电部件的保持环
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申请号： US11865303申请日： 2007-10-01
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公开(公告)号： US20080038999A1公开(公告)日： 2008-02-14
- 发明人: Antoine Manens , Suresh Shrauti , Alain Duboust , Yan Wang , Liang-Yuh Chen
- 申请人： Antoine Manens , Suresh Shrauti , Alain Duboust , Yan Wang , Liang-Yuh Chen
- 申请人地址： US CA Santa Clara
- 专利权人： APPLIED MATERIALS, INC.
- 当前专利权人： APPLIED MATERIALS, INC.
- 当前专利权人地址： US CA Santa Clara
- 主分类号： H01L21/302
- IPC分类号： H01L21/302 ; B24B5/00
摘要：
A retaining ring for use with electrochemical mechanical processing is described. The retaining ring has a generally annular body formed with a conductive portion and a non-conductive portion. The non-conductive portion contacts the substrate during polishing. The conductive portion is electrically biased during polishing to reduce the edge effect that tends to occur with conventional electrochemical mechanical processing systems.
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