Invention Application
US20080041307A1 CONTROL OF GAS FLOW AND DELIVERY TO SUPPRESS THE FORMATION OF PARTICLES IN AN MOCVD/ALD SYSTEM 有权
控制气体流动和输送以抑制MOCVD / ALD系统中颗粒的形成

CONTROL OF GAS FLOW AND DELIVERY TO SUPPRESS THE FORMATION OF PARTICLES IN AN MOCVD/ALD SYSTEM
Abstract:
The embodiments of the invention describe a process chamber, such as an ALD chamber, that has gas delivery conduits with gradually increasing diameters to reduce Joule-Thompson effect during gas delivery, a ring-shaped gas liner leveled with the substrate support to sustain gas temperature and to reduce gas flow to the substrate support backside, and a gas reservoir to allow controlled delivery of process gas. The gas conduits with gradually increasing diameters, the ring-shaped gas liner, and the gas reservoir help keep the gas temperature stable and reduce the creation of particles.
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