Invention Application
US20080041307A1 CONTROL OF GAS FLOW AND DELIVERY TO SUPPRESS THE FORMATION OF PARTICLES IN AN MOCVD/ALD SYSTEM
有权
控制气体流动和输送以抑制MOCVD / ALD系统中颗粒的形成
- Patent Title: CONTROL OF GAS FLOW AND DELIVERY TO SUPPRESS THE FORMATION OF PARTICLES IN AN MOCVD/ALD SYSTEM
- Patent Title (中): 控制气体流动和输送以抑制MOCVD / ALD系统中颗粒的形成
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Application No.: US11925684Application Date: 2007-10-26
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Publication No.: US20080041307A1Publication Date: 2008-02-21
- Inventor: Son Nguyen , Kedarnath Sangam , Miriam Schwartz , Kenric Choi , Sanjay Bhat , Pravin Narwankar , Shreyas Kher , Rahul Sharangapani , Shankar Muthukrishnam , Paul Deaton
- Applicant: Son Nguyen , Kedarnath Sangam , Miriam Schwartz , Kenric Choi , Sanjay Bhat , Pravin Narwankar , Shreyas Kher , Rahul Sharangapani , Shankar Muthukrishnam , Paul Deaton
- Main IPC: C23C16/00
- IPC: C23C16/00 ; F15C1/16

Abstract:
The embodiments of the invention describe a process chamber, such as an ALD chamber, that has gas delivery conduits with gradually increasing diameters to reduce Joule-Thompson effect during gas delivery, a ring-shaped gas liner leveled with the substrate support to sustain gas temperature and to reduce gas flow to the substrate support backside, and a gas reservoir to allow controlled delivery of process gas. The gas conduits with gradually increasing diameters, the ring-shaped gas liner, and the gas reservoir help keep the gas temperature stable and reduce the creation of particles.
Public/Granted literature
- US07794544B2 Control of gas flow and delivery to suppress the formation of particles in an MOCVD/ALD system Public/Granted day:2010-09-14
Information query
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