发明申请
US20080050573A1 Silicon Nanosheet , Nanosheet Solution and Process for Producing the Same, Nanosheet -Containing Composite, and Nanosheet Aggregate
审中-公开
硅纳米片,纳米片溶液及其制备方法,纳米片 - 复合材料和纳米片聚集体
- 专利标题: Silicon Nanosheet , Nanosheet Solution and Process for Producing the Same, Nanosheet -Containing Composite, and Nanosheet Aggregate
- 专利标题(中): 硅纳米片,纳米片溶液及其制备方法,纳米片 - 复合材料和纳米片聚集体
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申请号: US11628031申请日: 2005-07-14
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公开(公告)号: US20080050573A1公开(公告)日: 2008-02-28
- 发明人: Hideyuki Nakano , Hiroshi Nakamura , Takuya Mitsuoka , Yusuke Akimoto , Eiichi Sudo
- 申请人: Hideyuki Nakano , Hiroshi Nakamura , Takuya Mitsuoka , Yusuke Akimoto , Eiichi Sudo
- 申请人地址: JP Aichi-ken
- 专利权人: Kabushiki Kaisha Toyota Chuo Kenkyusho
- 当前专利权人: Kabushiki Kaisha Toyota Chuo Kenkyusho
- 当前专利权人地址: JP Aichi-ken
- 优先权: JP2004-210290 20040716
- 国际申请: PCT/JP05/13050 WO 20050714
- 主分类号: B32B9/00
- IPC分类号: B32B9/00 ; C01B15/14
摘要:
A silicon nanosheet comprising a silicon atom layer formed by bonding two-dimensionally and periodically arranged silicon atoms to each other through an Si—Si bond. A nanosheet solution prepared by dispersing or suspending the silicon nanosheets in a solvent. A nanosheet-containing composite having the silicon nanosheets on the surface and/or in the interior of a substrate. A nanosheet aggregate formed by aggregating the silicon nanosheets. A process for producing a nanosheet solution comprising: an acid treatment step of bringing a layered silicon compound into contact with an aqueous acid solution to derive a siloxene compound; and an exfoliation step of adding the siloxene compound into a solvent containing a surfactant, shaking the mixture, and peeling off the siloxene compound.
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