发明申请
- 专利标题： METHOD AND SYSTEM FOR YIELD AND PRODUCTIVITY IMPROVEMENTS IN SEMICONDUCTOR PROCESSING
- 专利标题（中）： 半导体加工中的生产率和生产率改进方法与系统
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申请号： US11559781申请日： 2006-11-14
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公开(公告)号： US20080064127A1公开(公告)日： 2008-03-13
- 发明人: Chen-Hua Yu , Lawrance Sheu , Yi-Li Hsiao , Francis Ko
- 申请人： Chen-Hua Yu , Lawrance Sheu , Yi-Li Hsiao , Francis Ko
- 申请人地址： TW Hsin-Chu
- 专利权人： TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
- 当前专利权人： TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
- 当前专利权人地址： TW Hsin-Chu
- 主分类号： H01L21/66
- IPC分类号： H01L21/66
摘要：
A semiconductor processing method includes processing a first substrate while detecting at least one first processing parameter value in a first apparatus. The first processing parameter is analyzed, thereby yielding at least one first predicted parameter value. The first predicted parameter value is compared with a first pre-defined parameter value, thereby yielding at least one first comparison result. A first recipe is applied corresponding to the first comparison result for processing a second substrate in the first apparatus.
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