Invention Application
US20080077352A1 METHODS AND APPARATUS FOR USING AN OPTICALLY TUNABLE SOFT MASK PROFILE LIBRARY 审中-公开
使用光学柔性掩模型材库的方法和装置

METHODS AND APPARATUS FOR USING AN OPTICALLY TUNABLE SOFT MASK PROFILE LIBRARY
Abstract:
The present invention provides methods and system for improving the accuracy of measurements made using optical metrology. The present invention relates to methods and systems for changing the optical properties of tunable resists that can be used in the production of electronic devices such as integrated circuits. Further, the invention provides methods and systems for using a modifiable resist layer that provides a first set of optical properties before exposure and a second set of optical properties after exposure.
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