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公开(公告)号：US07763404B2
公开(公告)日：2010-07-27
申请号：US11535247
申请日：2006-09-26
Applicant: James E. Willis , Manuel Perez , Asao Yamashita
Inventor： James E. Willis , Manuel Perez , Asao Yamashita
IPC: G03F9/00
CPC classification number: G03B27/42 , G01N21/4788 , G01N21/956 , G01N2021/95615 , G03F7/40
Abstract: The present invention provides methods and system for improving the accuracy of measurements made using optical metrology. The present invention relates to methods and systems for changing the optical properties of tunable resists that can be used in the production of electronic devices such as integrated circuits. Further, the invention provides methods and systems for using a modifiable resist layer that provides a first set of optical properties before exposure and a second set of optical properties after exposure.
Abstract translation: 本发明提供了使用光学测量提高测量精度的方法和系统。 本发明涉及用于改变可用于生产诸如集成电路的电子器件的可调谐抗蚀剂的光学性质的方法和系统。 此外，本发明提供了用于使用在曝光之前提供第一组光学特性并且在曝光后提供第二组光学性质的可修改抗蚀剂层的方法和系统。
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2.发明授权Methods and apparatus for using an optically tunable soft mask to create a profile library 有权使用光学可调软掩模创建轮廓文件库的方法和装置公开(公告)号：US07555395B2
公开(公告)日：2009-06-30
申请号：US11535320
申请日：2006-09-26
Applicant: James E. Willis , James E. Klekotka
Inventor： James E. Willis , James E. Klekotka
IPC: G06F19/00
CPC classification number: G03F7/70625 , G03F7/70516
Abstract: The present invention provides methods and system for improving the accuracy of measurements made using optical metrology. The present invention relates to methods and systems for changing the optical properties of tunable resists that can be used in the production of electronic devices such as integrated circuits. Further, the invention provides methods and systems for using a modifiable resist layer that provides a first set of optical properties before exposure and a second set of optical properties after exposure.
Abstract translation: 本发明提供了使用光学测量提高测量精度的方法和系统。 本发明涉及用于改变可用于生产诸如集成电路的电子器件的可调谐抗蚀剂的光学性质的方法和系统。 此外，本发明提供了用于使用在曝光之前提供第一组光学特性并且在曝光后提供第二组光学性质的可修改抗蚀剂层的方法和系统。
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公开(公告)号：US20080076045A1
公开(公告)日：2008-03-27
申请号：US11535247
申请日：2006-09-26
Applicant: James E. Willis , Manuel Perez , Asao Yamashita
Inventor： James E. Willis , Manuel Perez , Asao Yamashita
CPC classification number: G03B27/42 , G01N21/4788 , G01N21/956 , G01N2021/95615 , G03F7/40
Abstract: The present invention provides methods and system for improving the accuracy of measurements made using optical metrology. The present invention relates to methods and systems for changing the optical properties of tunable resists that can be used in the production of electronic devices such as integrated circuits. Further, the invention provides methods and systems for using a modifiable resist layer that provides a first set of optical properties before exposure and a second set of optical properties after exposure.
Abstract translation: 本发明提供了使用光学测量提高测量精度的方法和系统。 本发明涉及用于改变可用于生产诸如集成电路的电子器件的可调谐抗蚀剂的光学性质的方法和系统。 此外，本发明提供了用于使用在曝光之前提供第一组光学特性并且在曝光后提供第二组光学性质的可修改抗蚀剂层的方法和系统。
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公开(公告)号：US3537545A
公开(公告)日：1970-11-03
申请号：US3537545D
申请日：1968-10-23
Applicant: JAMES E WILLIS , REFFORD L LEGGETT
Inventor： WILLIS JAMES E , LEGGETT REFFORD L
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公开(公告)号：US07213478B2
公开(公告)日：2007-05-08
申请号：US10776452
申请日：2004-02-12
Applicant: Satoshi Harada , Edward C. Hume, III , James E Willis , Kevin Andrew Chamness , Hieu A Lam , Hongyu Yue , David Fatke
Inventor： Satoshi Harada , Edward C. Hume, III , James E Willis , Kevin Andrew Chamness , Hieu A Lam , Hongyu Yue , David Fatke
IPC: G01N19/00
CPC classification number: G05B19/41865 , G05B19/41845 , G05B2219/31334 , G05B2219/32191 , G05B2219/45031 , Y02P90/16 , Y02P90/185 , Y02P90/20 , Y02P90/22 , Y02P90/86
Abstract: A method of automatically configuring an Advanced Process Control (APC) system for a semiconductor manufacturing environment in which an auto-configuration script is generated for executing an auto-configuration program. The auto-configuration script activates default values for input to the auto-configuration program. The auto-configuration script is executed to generate an enabled parameter file output from the auto-configuration program. The enabled parameter file identifies parameters for statistical process control (SPC) chart generation.
Abstract translation: 一种自动配置用于半导体制造环境的高级过程控制（APC）系统的方法，其中生成用于执行自动配置程序的自动配置脚本。 自动配置脚本激活自动配置程序输入的默认值。 执行自动配置脚本以生成从自动配置程序输出的启用参数文件。 启用的参数文件识别统计过程控制（SPC）图生成的参数。
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Patent Agency Ranking
公开(公告)号：US07437199B2
公开(公告)日：2008-10-14
申请号：US10854424
申请日：2004-05-27
Applicant: James E Willis , Satoshi Harada , Edward C Hume, III , James E Klekotka
Inventor： James E Willis , Satoshi Harada , Edward C Hume, III , James E Klekotka
CPC classification number: G05B19/4183 , G05B2219/31288 , Y02P90/10 , Y02P90/14
Abstract: A method of using an APC system to perform a data pre-population function is described in which the APC system is coupled to a processing element. The APC system comprises an APC computer including operational software, a database coupled to the APC computer, and a GUI, and the processing element comprises at least one of a tool, a processing module, and a sensor. When the APC system operates, the APC system collects data from the processing element and stores the collected data in the database. When an APC malfunction occurs, a data recovery (data pre-population) can be performed. When some of the historical data is missing, a data recovery (data pre-population) can be performed. When an APC system is coupled to a new tool having some historical data, a data recovery (data pre-population) can be performed.
Abstract translation: 描述了使用APC系统执行数据预先插入功能的方法，其中APC系统耦合到处理元件。 APC系统包括APC计算机，其包括操作软件，耦合到APC计算机的数据库和GUI，并且处理元件包括工具，处理模块和传感器中的至少一个。 当APC系统运行时，APC系统从处理元件收集数据，并将收集的数据存储在数据库中。 当发生APC故障时，可以执行数据恢复（数据预填充）。 当某些历史数据丢失时，可以执行数据恢复（数据预先填充）。 当APC系统耦合到具有一些历史数据的新工具时，可以执行数据恢复（数据预先填充）。
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公开(公告)号：US5743838A
公开(公告)日：1998-04-28
申请号：US747775
申请日：1996-11-13
Applicant: James E. Willis
Inventor： James E. Willis
IPC: A63B21/04 , A63B21/055 , A63B21/16 , A63B21/02
CPC classification number: A63B21/0552 , A63B21/1609 , A63B21/04 , A63B21/0407 , A63B21/0442 , A63B21/0555 , A63B21/0557 , A63B21/1645 , A63B2208/0233
Abstract: A method and apparatus for an exercising device. The exercising device includes an elongated flexible body having a first extremity and a second extremity disposed to either side of a central portion and an elongated elastic member. The elongated elastic member includes a first end and a second end. The first and second ends are (i) adapted to accommodate a human limb and (ii) adapted to removably couple to the central portion of the elongated flexible body. A plurality of ring structures are disposed along an axis extending between the first extremity and the second extremity of the elongated flexible body, a first clip is disposed at the first end of the elongated elastic member and a second clip is disposed at the second end of the elongated elastic member. The first and second clips are adapted to couple the first and the second ends of the elongated elastic member to ones of the plurality of ring structures. The plurality of ring structures desirably includes a piece of cloth material sewn to the body so as to permanently capture flat portions of D-rings and attach the D-rings along the axis and to the elongated flexible body.
Abstract translation: 一种锻炼装置的方法和装置。 锻炼装置包括细长的柔性体，其具有设置在中心部分的任一侧和细长的弹性构件的第一末端和第二末端。 细长的弹性构件包括第一端和第二端。 第一和第二端是（i）适于容纳人的肢体和（ii）适于可移除地联接到细长的柔性体的中心部分。 沿着在细长柔性体的第一末端和第二末端之间延伸的轴线设置多个环形结构，第一夹子设置在细长弹性构件的第一端处，第二夹子设置在第二端部的第二端 细长的弹性构件。 第一和第二夹子适于将细长弹性构件的第一和第二端联接到多个环形结构中的一个。 多个环结构理想地包括缝合到主体的一块布料，以便永久地捕获D形环的平坦部分并且沿着轴线和细长的柔性体附接D形环。
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8.发明授权公开(公告)号：US07477960B2
公开(公告)日：2009-01-13
申请号：US11058321
申请日：2005-02-16
Applicant: James E. Willis , Merritt Funk , Kevin Lally , Kevin Pinto , Masayuki Tomoyasu , Raymond Peterson , Radha Sundararajan
Inventor： James E. Willis , Merritt Funk , Kevin Lally , Kevin Pinto , Masayuki Tomoyasu , Raymond Peterson , Radha Sundararajan
IPC: G06F19/00
CPC classification number: G05B19/4184 , G05B2219/31356 , G05B2219/32179 , G05B2219/45031 , Y02P80/40 , Y02P90/14 , Y02P90/20 , Y02P90/22 , Y02P90/86
Abstract: A method for implementing FDC in an APC system including receiving an FDC model from memory; providing the FDC model to a process model calculation engine; computing a vector of predicted dependent process parameters using the process model calculation engine; receiving a process recipe comprising a set of recipe parameters, providing the process recipe to a process module; executing the process recipe to produce a vector of measured dependent process parameters; calculating a difference between the vector of predicted dependent process parameters and the vector of measured dependent process parameters; comparing the difference to a threshold value; and declaring a fault condition when the difference is greater than the threshold value.
Abstract translation: 一种用于在APC系统中实现FDC的方法，包括从存储器接收FDC模型; 将FDC模型提供给过程模型计算引擎; 使用过程模型计算引擎计算预测的依赖过程参数的向量; 接收包括一组配方参数的处理配方，向处理模块提供处理配方; 执行过程配方以产生测量的依赖过程参数的向量; 计算预测的依赖过程参数的向量与测量的依赖过程参数的向量之间的差; 将差值与阈值进行比较; 并且当差值大于阈值时声明故障状况。
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9.发明申请METHODS AND APPARATUS FOR USING AN OPTICALLY TUNABLE SOFT MASK TO CREATE A PROFILE LIBRARY 有权使用光学可控软掩模创建简档库的方法和装置公开(公告)号：US20080077362A1
公开(公告)日：2008-03-27
申请号：US11535320
申请日：2006-09-26
Applicant: James E. Willis , James E. Klekotka
Inventor： James E. Willis , James E. Klekotka
CPC classification number: G03F7/70625 , G03F7/70516
Abstract: The present invention provides methods and system for improving the accuracy of measurements made using optical metrology. The present invention relates to methods and systems for changing the optical properties of tunable resists that can be used in the production of electronic devices such as integrated circuits. Further, the invention provides methods and systems for using a modifiable resist layer that provides a first set of optical properties before exposure and a second set of optical properties after exposure.
Abstract translation: 本发明提供了使用光学测量提高测量精度的方法和系统。 本发明涉及用于改变可用于生产诸如集成电路的电子器件的可调谐抗蚀剂的光学性质的方法和系统。 此外，本发明提供了用于使用在曝光之前提供第一组光学特性并且在曝光后提供第二组光学性质的可修改抗蚀剂层的方法和系统。
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公开(公告)号：US20080074678A1
公开(公告)日：2008-03-27
申请号：US11535407
申请日：2006-09-26
Applicant: James E. Willis , James E. Klekotka
Inventor： James E. Willis , James E. Klekotka
IPC: G01B11/24
CPC classification number: G01N21/4788 , G01N21/95607 , G01N2021/95615 , G03F7/0392
Abstract: The present invention provides methods and system for improving the accuracy of measurements made using optical metrology. The present invention relates to methods and systems for changing the optical properties of tunable resists that can be used in the production of electronic devices such as integrated circuits. Further, the invention provides methods and systems for using a modifiable resist layer that provides a first set of optical properties before exposure and a second set of optical properties after exposure.
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