Invention Application
- Patent Title: METHODS AND APPARATUS FOR USING AN OPTICALLY TUNABLE SOFT MASK TO CREATE A PROFILE LIBRARY
- Patent Title (中): 使用光学可控软掩模创建简档库的方法和装置
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Application No.: US11535320Application Date: 2006-09-26
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Publication No.: US20080077362A1Publication Date: 2008-03-27
- Inventor: James E. Willis , James E. Klekotka
- Applicant: James E. Willis , James E. Klekotka
- Applicant Address: JP Tokyo
- Assignee: TOKYO ELECTRON LIMITED
- Current Assignee: TOKYO ELECTRON LIMITED
- Current Assignee Address: JP Tokyo
- Main IPC: G06F15/00
- IPC: G06F15/00 ; G06F15/18 ; G01B11/30
Abstract:
The present invention provides methods and system for improving the accuracy of measurements made using optical metrology. The present invention relates to methods and systems for changing the optical properties of tunable resists that can be used in the production of electronic devices such as integrated circuits. Further, the invention provides methods and systems for using a modifiable resist layer that provides a first set of optical properties before exposure and a second set of optical properties after exposure.
Public/Granted literature
- US07555395B2 Methods and apparatus for using an optically tunable soft mask to create a profile library Public/Granted day:2009-06-30
Information query
