发明申请
- 专利标题： Underlayer Coating Forming Composition For Lythography Containing Compound Having Protected Carboxyl Group
- 专利标题（中）： 含有保护性羧基的化合物的底图涂层组合物
-
申请号： US11795520申请日： 2006-01-06
-
公开(公告)号： US20080102649A1公开(公告)日： 2008-05-01
- 发明人: Satoshi Takei , Tetsuya Shinjo , Keisuke Hashimoto , Yasushi Sakaida
- 申请人： Satoshi Takei , Tetsuya Shinjo , Keisuke Hashimoto , Yasushi Sakaida
- 申请人地址： JP TOKYO
- 专利权人： NISSAN CHEMICAL INDUSTRIES, LTD.
- 当前专利权人： NISSAN CHEMICAL INDUSTRIES, LTD.
- 当前专利权人地址： JP TOKYO
- 优先权： JP2005-014652 20050121
- 国际申请： PCT/JP06/00080 WO 20060106
- 主分类号： H01L21/31
- IPC分类号： H01L21/31 ; C09D4/00
摘要：
There is provided an underlayer coating forming composition for lithography that is used in lithography process of the manufacture of semiconductor devices and that has a high dry etching rate in comparison to photoresists, does not intermix with photoresists, and is capable of flattening the surface of a semi conductor substrate having holes of a high aspect ratio.The underlayer coating forming composition for lithography comprises, a compound having two or more protected carboxylic groups, a compound having two or more epoxy groups, and a solvent.
公开/授权文献
信息查询
IPC分类:
