发明申请
US20080105558A1 Electrochemically Fabricated Hermetically Sealed Microstructures and Methods of and Apparatus for Producing Such Structures
审中-公开
电化学制造的密封微结构,以及用于生产这种结构的方法和装置
- 专利标题: Electrochemically Fabricated Hermetically Sealed Microstructures and Methods of and Apparatus for Producing Such Structures
- 专利标题(中): 电化学制造的密封微结构,以及用于生产这种结构的方法和装置
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申请号: US11927680申请日: 2007-10-30
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公开(公告)号: US20080105558A1公开(公告)日: 2008-05-08
- 发明人: Adam Cohen , Michael Lockard , Dennis Smalley , Vacit Arat , Christopher Bang , John Dixon
- 申请人: Adam Cohen , Michael Lockard , Dennis Smalley , Vacit Arat , Christopher Bang , John Dixon
- 专利权人: Microfabrica Inc.
- 当前专利权人: Microfabrica Inc.
- 主分类号: C25D5/10
- IPC分类号: C25D5/10
摘要:
In some embodiments, multilayer structures are electrochemically fabricated from at least one structural material (e.g. nickel), at least one sacrificial material (e.g. copper), and at least one sealing material (e.g. solder). In some embodiments, the layered structure is made to have a desired configuration which is at least partially and immediately surrounded by sacrificial material which is in turn surrounded almost entirely by structural material. The surrounding structural material includes openings in the surface through which etchant can attack and remove trapped sacrificial material found within. Sealing material is located near the openings. After removal of the sacrificial material, the box is evacuated or filled with a desired gas or liquid. Thereafter, the sealing material is made to flow, seal the openings, and resolidify. In other embodiments, a post-layer formation lid or other enclosure completing structure is added.
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