发明申请
US20080108227A1 Method for producing single electron semiconductor element 有权
单电子半导体元件的制造方法

Method for producing single electron semiconductor element
摘要:
The present invention provides a method for production of a single electron semiconductor element (SET) in which a quantum dot is selectively arranged in a nano gap between fine electrodes, whereby the product yield is significantly improved, leading to excellent practical applicability. The method for production of SET of the present invention is characterized in that a solution containing ferritin including a metal or semiconductor particle therein, and a nonionic surfactant is dropped on a substrate having a source electrode and a drain electrode formed by laminating a titanium film and a film of a metal other than titanium, whereby the ferritin is selectively arranged in a nano gap between the source electrode/drain electrode. In the method for production of SET of the present invention, the metal or semiconductor particle can be fixed as a quantum dot at a suitable position in the nano gap between the source electrode/drain electrode following decomposition of ferritin, and in addition, formation of unnecessary quantum dot can be suppressed.
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