发明申请
US20080134120A1 SEMICONDUCTOR LAYOUT DESIGN APPARATUS, SEMICONDUCTOR LAYOUT DESIGN METHOD AND COMPUTER READABLE MEDIUM
有权
半导体布局设计设备,半导体布局设计方法和计算机可读介质
- 专利标题: SEMICONDUCTOR LAYOUT DESIGN APPARATUS, SEMICONDUCTOR LAYOUT DESIGN METHOD AND COMPUTER READABLE MEDIUM
- 专利标题(中): 半导体布局设计设备,半导体布局设计方法和计算机可读介质
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申请号: US11941739申请日: 2007-11-16
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公开(公告)号: US20080134120A1公开(公告)日: 2008-06-05
- 发明人: Shen Wang , Tetsuaki Utsumi , Mizue Sekine
- 申请人: Shen Wang , Tetsuaki Utsumi , Mizue Sekine
- 申请人地址: JP Tokyo
- 专利权人: KABUSHIKI KAISHA TOSHIBA
- 当前专利权人: KABUSHIKI KAISHA TOSHIBA
- 当前专利权人地址: JP Tokyo
- 优先权: JP2006-312007 20061117
- 主分类号: G06F17/50
- IPC分类号: G06F17/50
摘要:
A semiconductor layout design apparatus has an inter-block connection information extracting part, a block global placement part and a cell placement setting part. The inter-block connection information extracting part configured to extract the number of wiring connections between a plurality of blocks including standard cells and macrocells based on a net list, library information, floor plan information and technology information. The block global placement part configured to roughly place the plurality of blocks in a placement region on a semiconductor substrate. The cell placement setting part configured to set placement positions of the macrocells in the block based on a positioning relationship with the other block and the number of the wiring connections with the other block with respect to each of the plurality of blocks roughly placed by the block global placement part.
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