发明申请
US20080134483A1 Substrate processing apparatus and manufacturing method for semiconductor devices 有权
基板处理装置及半导体装置的制造方法

  • 专利标题: Substrate processing apparatus and manufacturing method for semiconductor devices
  • 专利标题(中): 基板处理装置及半导体装置的制造方法
  • 申请号: US11984589
    申请日: 2007-11-20
  • 公开(公告)号: US20080134483A1
    公开(公告)日: 2008-06-12
  • 发明人: Yukinori Aburatani
  • 申请人: Yukinori Aburatani
  • 申请人地址: JP Tokyo
  • 专利权人: HITACHI KOKUSAI ELECTRIC INC.
  • 当前专利权人: HITACHI KOKUSAI ELECTRIC INC.
  • 当前专利权人地址: JP Tokyo
  • 优先权: JP2006-318343 20061127; JP2007-291866 20071109
  • 主分类号: H01L21/67
  • IPC分类号: H01L21/67
Substrate processing apparatus and manufacturing method for semiconductor devices
摘要:
A substrate processing apparatus comprises a storage container for storing multiple substrates and whose substrate loading and unloading opening is shut by a lid, a loading and unloading port for carrying the storage container into and out of the case, a placement unit for placing the storage container in the loading and unloading port, a storage chamber provided adjacent to the loading and unloading port for storing the storage container, an opening and closing device for opening and closing the substrate loading and unloading opening of the storage container placed in the placement unit, a transfer device containing a holding mechanism for supporting the bottom of the storage container and transferring the storage container supported in the holding mechanism, over the opening and closing device between the inside and outside of the storage chamber, and an elevator mechanism for raising and lowering the placement unit between the placement unit height position where the opening and closing device opens and closes the storage container, and a height position where the transfer device gives and receives the storage container.
信息查询
0/0