公开(公告)号：US20130012035A1

公开(公告)日：2013-01-10

申请号：US13536128

申请日：2012-06-28

申请人： Yukinori Aburatani ,  Toshiya Shimada ,  Kenji Shinozaki ,  Tomihiro Amano ,  Hiroshi Ashihara ,  Hidehiro Yanai ,  Masahiro Miyake ,  Shin Hiyama

发明人： Yukinori Aburatani ,  Toshiya Shimada ,  Kenji Shinozaki ,  Tomihiro Amano ,  Hiroshi Ashihara ,  Hidehiro Yanai ,  Masahiro Miyake ,  Shin Hiyama

IPC分类号： H01L21/26

CPC分类号： H01L21/67115 ,  C23C16/481 ,  F27B5/14 ,  F27B17/0025 ,  F27D2009/0056 ,  H01L21/324 ,  H05B3/0047 ,  H05B3/08

摘要： A substrate processing apparatus capable of increasing the life span of a lamp for heating a substrate is provided. The substrate processing apparatus includes: a light receiving chamber for processing a substrate; a substrate support unit inside the light receiving chamber; a lamp including an electrical wire, and a seal accommodating the electrical wire to hermetically seal the lamp with a gas therein, the lamp irradiating the substrate with a light; a lamp receiving unit outside the light receiving chamber to accommodate the lamp therein, the lamp receiving unit including a lamp connector connected to the lamp to supply an electric current through the electrical wire, a heat absorption member including a material having a thermal conductivity higher than that of the seal, and a base member fixing the heat absorption member; and an external electrical wire connected to the lamp connector to supply current to the lamp connector.

摘要翻译： 提供了能够增加用于加热基板的灯的寿命的基板处理装置。 基板处理装置包括：用于处理基板的光接收室; 光接收室内的基板支撑单元; 包括电线的灯和容纳所述电线以密封所述灯的密封件的密封件，所述灯用光照射所述基板; 在所述光接收室外部的灯接收单元，用于容纳所述灯，所述灯接收单元包括连接到所述灯的灯连接器以通过所述电线提供电流;吸热构件，其包括导热率高于 密封件的固定件和固定吸热件的基件; 以及连接到灯连接器以向灯连接器提供电流的外部电线。

公开(公告)号：US6143083A

公开(公告)日：2000-11-07

申请号：US453031

申请日：1999-12-02

申请人： Shuji Yonemitsu ,  Toshikazu Karino ,  Hisashi Yoshida ,  Shinichiro Watahiki ,  Yuji Yoshida ,  Hideo Shimura ,  Takeshi Sugimoto ,  Yukinori Aburatani ,  Kazuhito Ikeda

发明人： Shuji Yonemitsu ,  Toshikazu Karino ,  Hisashi Yoshida ,  Shinichiro Watahiki ,  Yuji Yoshida ,  Hideo Shimura ,  Takeshi Sugimoto ,  Yukinori Aburatani ,  Kazuhito Ikeda

IPC分类号： B65G49/07 ,  H01L21/00 ,  H01L21/677 ,  C23C16/00

CPC分类号： H01L21/67781 ,  H01L21/67103 ,  H01L21/67161 ,  H01L21/67167 ,  H01L21/67173 ,  H01L21/67178 ,  H01L21/67184 ,  H01L21/67742 ,  H01L21/67745 ,  H01L21/67754 ,  H01L21/67766 ,  Y10S414/135 ,  Y10S414/136 ,  Y10S414/137 ,  Y10S414/139 ,  Y10S414/14

摘要： A substrate processing apparatus comprises a substrate transfer chamber; a substrate processing chamber disposed on a first side wall of the substrate transfer chamber; an intermediate substrate holding chamber disposed on a second side wall of the substrate transfer chamber; a first substrate holder disposed within the intermediate substrate holding chamber; a second substrate holder disposed within the substrate processing chamber; a first substrate transfer robot, disposed within the substrate transfer chamber, for transferring the substrate between the substrate processing chamber and the intermediate substrate holding chamber; a first gate valve disposed between the substrate processing chamber and the substrate transfer chamber; a second gate valve disposed between the substrate transfer chamber and the intermediate substrate holding chamber; an atmospheric pressure section located opposite to the substrate transfer chamber with respect to the intermediate substrate holding chamber; a third valve disposed between the intermediate substrate holding chamber and the atmospheric pressure section; a cassette holder disposed within the atmospheric pressure section; and a second substrate transfer robot disposed within the atmospheric pressure section, for transferring the substrate between a cassette held in the cassette holder and the intermediate substrate holding chamber.

摘要翻译： 衬底处理设备包括衬底传送室; 衬底处理室，设置在所述衬底传送室的第一侧壁上; 设置在所述基板传送室的第二侧壁上的中间基板保持室; 设置在所述中间基板保持室内的第一基板保持架; 设置在所述衬底处理室内的第二衬底保持器; 第一基板传送机器人，设置在所述基板传送室内，用于在所述基板处理室和所述中间基板保持室之间传送所述基板; 设置在所述基板处理室和所述基板输送室之间的第一闸阀; 设置在所述基板传送室和所述中间基板保持室之间的第二闸阀; 相对于中间基板保持室与基板传送室相对的大气压部分; 设置在所述中间基板保持室和所述大气压力部之间的第三阀; 设置在大气压力区段内的盒座; 以及设置在所述大气压力部分内的第二衬底传送机器人，用于将所述衬底转移到保持在所述盒保持器中的盒和所述中间衬底保持室之间。

公开(公告)号：US6066210A

公开(公告)日：2000-05-23

申请号：US692461

申请日：1996-08-05

申请人： Shuji Yonemitsu ,  Toshikazu Karino ,  Hisashi Yoshida ,  Shinichiro Watahiki ,  Yuji Yoshida ,  Hideo Shimura ,  Takeshi Sugimoto ,  Yukinori Aburatani ,  Kazuhito Ikeda

发明人： Shuji Yonemitsu ,  Toshikazu Karino ,  Hisashi Yoshida ,  Shinichiro Watahiki ,  Yuji Yoshida ,  Hideo Shimura ,  Takeshi Sugimoto ,  Yukinori Aburatani ,  Kazuhito Ikeda

IPC分类号： B65G49/07 ,  H01L21/00 ,  H01L21/677 ,  C23C16/00

CPC分类号： H01L21/67781 ,  H01L21/67103 ,  H01L21/67161 ,  H01L21/67167 ,  H01L21/67173 ,  H01L21/67178 ,  H01L21/67184 ,  H01L21/67742 ,  H01L21/67745 ,  H01L21/67754 ,  H01L21/67766 ,  Y10S414/135 ,  Y10S414/136 ,  Y10S414/137 ,  Y10S414/139 ,  Y10S414/14

摘要： A substrate processing apparatus comprises a substrate transfer chamber; a substrate processing chamber disposed on a first side wall of the substrate transfer chamber; an intermediate substrate holding chamber disposed on a second side wall of the substrate transfer chamber; a first substrate holder disposed within the intermediate substrate holding chamber; a second substrate holder disposed within the substrate processing chamber; a first substrate transfer robot, disposed within the substrate transfer chamber, for transferring the substrate between the substrate processing chamber and the intermediate substrate holding chamber; a first gate valve disposed between the substrate processing chamber and the substrate transfer chamber; a second gate valve disposed between the substrate transfer chamber and the intermediate substrate holding chamber; an atmospheric pressure section located opposite to the substrate transfer chamber with respect to the intermediate substrate holding chamber; a third valve disposed between the intermediate substrate holding chamber and the atmospheric pressure section; a cassette holder disposed within the atmospheric pressure section; and a second substrate transfer robot disposed within the atmospheric pressure section, for transferring the substrate between a cassette held in the cassette holder and the intermediate substrate holding chamber.

摘要翻译： 衬底处理设备包括衬底传送室; 衬底处理室，设置在所述衬底传送室的第一侧壁上; 设置在所述基板传送室的第二侧壁上的中间基板保持室; 设置在所述中间基板保持室内的第一基板保持件; 设置在所述衬底处理室内的第二衬底保持器; 第一基板传送机器人，设置在所述基板传送室内，用于在所述基板处理室和所述中间基板保持室之间传送所述基板; 设置在所述基板处理室和所述基板输送室之间的第一闸阀; 设置在所述基板传送室和所述中间基板保持室之间的第二闸阀; 相对于中间基板保持室与基板传送室相对的大气压部分; 设置在所述中间基板保持室和所述大气压力部之间的第三阀; 设置在大气压力区段内的盒座; 以及设置在所述大气压力部分内的第二衬底传送机器人，用于将所述衬底转移到保持在所述盒保持器中的盒和所述中间衬底保持室之间。

公开(公告)号：US5788447A

公开(公告)日：1998-08-04

申请号：US691946

申请日：1996-08-05

申请人： Shuji Yonemitsu ,  Toshikazu Karino ,  Hisashi Yoshida ,  Shinichiro Watahiki ,  Yuji Yoshida ,  Hideo Shimura ,  Takeshi Sugimoto ,  Yukinori Aburatani ,  Kazuhito Ikeda

发明人： Shuji Yonemitsu ,  Toshikazu Karino ,  Hisashi Yoshida ,  Shinichiro Watahiki ,  Yuji Yoshida ,  Hideo Shimura ,  Takeshi Sugimoto ,  Yukinori Aburatani ,  Kazuhito Ikeda

IPC分类号： B65G49/07 ,  H01L21/00 ,  H01L21/677

CPC分类号： H01L21/67781 ,  H01L21/67103 ,  H01L21/67161 ,  H01L21/67167 ,  H01L21/67173 ,  H01L21/67178 ,  H01L21/67184 ,  H01L21/67742 ,  H01L21/67745 ,  H01L21/67754 ,  H01L21/67766 ,  Y10S414/135 ,  Y10S414/136 ,  Y10S414/137 ,  Y10S414/139 ,  Y10S414/14

摘要： A substrate processing apparatus comprises a substrate transfer chamber; a plurality of substrate processing chambers disposed on a first side wall of the substrate transfer chamber and stacked in the vertical direction; a plurality of first gate valves, each being disposed between each of the substrate processing chambers and the substrate transfer chamber; a substrate accommodating chamber disposed on a second side wall of the substrate transfer chamber; a substrate transfer device, disposed within the substrate transfer chamber, for transferring the substrate under reduced pressure between the substrate processing chambers and the substrate accommodating chamber; an elevator disposed outside the substrate transfer chamber and comprising a stationary portion and an elevating portion which is vertically movable with respect to the stationary portion; a rigid connecting member capable of moving through a through-hole formed in a predetermined face of the substrate transfer chamber, the rigid connecting member mechanically connecting the elevating portion and the substrate transfer device through the through-hole; and a sealing member for establishing a hermetic vacuum seal between the predetermined surface and the connecting member which penetrates through the through-hole.

摘要翻译： 衬底处理设备包括衬底传送室; 多个基板处理室，设置在所述基板输送室的第一侧壁上，并且在垂直方向上堆叠; 多个第一闸阀，各自设置在每个基板处理室和基板传送室之间; 设置在所述基板传送室的第二侧壁上的基板容纳室; 衬底传送装置，设置在衬底传送室内，用于在衬底处理室和衬底容纳室之间在减压下传送衬底; 设置在所述基板传送室的外侧的电梯，其包括固定部和相对于所述固定部垂直移动的升降部; 刚性连接构件，其能够移动通过形成在所述基板传送室的预定面中的通孔，所述刚性连接构件通过所述通孔机械地连接所述升降部分和所述基板传送装置; 以及密封构件，用于在预定表面和穿过通孔的连接构件之间建立密封的真空密封。

公开(公告)号：US08420167B2

公开(公告)日：2013-04-16

申请号：US12382618

申请日：2009-03-19

申请人： Seiyo Nakashima ,  Yukinori Aburatani

发明人： Seiyo Nakashima ,  Yukinori Aburatani

IPC分类号： C23C16/455

CPC分类号： C23C16/345 ,  C23C16/44 ,  C23C16/4412 ,  C23C16/45502 ,  C23C16/45519 ,  C23C16/4584

摘要： A method of manufacturing a semiconductor device includes the steps of: conveying a plurality of substrates disposed in a direction perpendicular to a substrate processing surface into a processing chamber provided inside of a reaction tube, with an outer periphery surrounded by a heating device; and processing the substrates by introducing gas to a gas inlet tube provided on a side face of the reaction tube in a region for processing the substrates inside the reaction tube, so as to reach at least an outside of the heating device, and spouting the gas into the processing chamber from a slit-shaped gas spouting port disposed in a form so as to straddle at least a plurality of the substrates in a direction perpendicular to the substrate processing surface.

摘要翻译： 一种制造半导体器件的方法包括以下步骤：将设置在与衬底处理表面垂直的方向上的多个衬底输送到设置在反应管内部的处理室中，其外周被加热装置包围; 并且通过在设置在反应管的侧面的气体导入管中的处理反应管内部的基板的区域中引入气体来处理基板，以至少到达加热装置的外部，并且喷射气体 从形成为以与基板处理表面垂直的方向跨越至少多个基板的形式的狭缝状气体喷射口将其进入处理室。

公开(公告)号：US08277161B2

公开(公告)日：2012-10-02

申请号：US12213679

申请日：2008-06-23

申请人： Yukinori Aburatani ,  Seiyo Nakashima

发明人： Yukinori Aburatani ,  Seiyo Nakashima

IPC分类号： H01L21/677

CPC分类号： H01L21/67742 ,  H01L21/67109 ,  H01L21/67766 ,  H01L21/67769

摘要： A substrate processing apparatus is equipped with a processing furnace for processing wafers, a loading port which is used for carrying a pod containing substrates into and out of a case, a pod transport mechanism for transporting the container at least from the entrance and exit place, and a top storage which is disposed above the processing furnace in such a manner that at least part of the top storage overlaps with the processing furnace in the direction of gravity.

摘要翻译： 基板处理装置配备有用于处理晶片的处理炉，用于将包含基板的壳体运送到壳体中的装载口，至少从入口和出口处输送容器的荚输送机构， 以及顶部储存器，其设置在处理炉上方，使得顶部储存器的至少一部分在重力方向上与处理炉重叠。

公开(公告)号：US20100280653A1

公开(公告)日：2010-11-04

申请号：US12760113

申请日：2010-04-14

申请人： Yukinori ABURATANI

发明人： Yukinori ABURATANI

IPC分类号： H01L21/677 ,  G06F7/00

CPC分类号： H01L21/67754 ,  H01L21/67259 ,  H01L21/67265 ,  H01L21/68707

摘要： There is provided a substrate processing apparatus capable of reducing a substrate carrying time. The substrate processing apparatus comprises a transfer machine configured to carry a substrate, a holding part configured to hold the substrate on the transfer machine, and a detector configured to detect whether the substrate is held on the transfer machine based on an operation of the holding part.

摘要翻译： 提供了能够减少基板搬运时间的基板处理装置。 基板处理装置包括配置成承载基板的转印机构，将基板保持在转印机上的保持部，以及基于保持部的操作来检测基板是否被保持在转印机上的检测器 。

公开(公告)号：US20100229416A1

公开(公告)日：2010-09-16

申请号：US12647952

申请日：2009-12-28

申请人： Yukinori ABURATANI ,  Seiyo NAKASHIMA ,  Masakazu SHIMADA

发明人： Yukinori ABURATANI ,  Seiyo NAKASHIMA ,  Masakazu SHIMADA

IPC分类号： F26B25/08

CPC分类号： H01L21/67757 ,  H01L21/67109 ,  H01L21/67115

摘要： Provided is a substrate processing apparatus that can decrease the time necessary for cooling a processed wafer for improving the throughput. The substrate processing apparatus comprises: a process chamber configured to process a substrate; a substrate supporter configured to support the substrate and load the substrate into the process chamber; a transfer mechanism configured to carry the substrate to the substrate supporter; and a non-sealing type shield part installed between the substrate supporter and the transfer mechanism.

摘要翻译： 提供了一种可以减少冷却处理晶片所需的时间以提高生产量的基板处理装置。 基板处理装置包括：处理室，被配置为处理基板; 衬底支撑件，其构造成支撑所述衬底并将所述衬底加载到所述处理室中; 传送机构，其构造成将所述基板运送到所述基板支撑件; 以及安装在基板支撑件和转印机构之间的非密封型屏蔽部。

公开(公告)号：US20080153314A1

公开(公告)日：2008-06-26

申请号：US11987493

申请日：2007-11-30

申请人： Akira Hayashida ,  Masaaki Ueno ,  Masakazu Shimada ,  Yukinori Aburatani ,  Tomoyuki Yamada ,  Sieyo Nakashima ,  Masashi Sugishita

发明人： Akira Hayashida ,  Masaaki Ueno ,  Masakazu Shimada ,  Yukinori Aburatani ,  Tomoyuki Yamada ,  Sieyo Nakashima ,  Masashi Sugishita

IPC分类号： H01L21/00 ,  B01J19/00 ,  F27B5/14

CPC分类号： H01L21/67109 ,  F27B17/0025

摘要： An object of the present invention is to improve substrate processing efficiency. A substrate processing apparatus has a reaction tube that processes a substrate inside, and a heating apparatus disposed so as to surround an external periphery of the reaction tube, so that at least a gas inlet tube is disposed on a side surface in an area in which the substrate is processed inside the reaction tube, and the heating apparatus has a heat insulator that surrounds the reaction tube, an inlet opening formed in the shape of a groove in the heat insulator from the lower end of the heating apparatus so as to avoid the gas inlet tube, and a heating element disposed between the heat insulator and the reaction tube.

摘要翻译： 本发明的目的是提高基板处理效率。 基板处理装置具有处理内部的基板的反应管和设置成围绕反应管的外周的加热装置，使得至少一个气体入口管设置在其中的 在反应管内加工基板，加热装置具有围绕反应管的绝热体，从加热装置的下端形成为绝热体的槽状的入口开口，以避免 气体入口管和设置在隔热件和反应管之间的加热元件。

公开(公告)号：US20080134483A1

公开(公告)日：2008-06-12

申请号：US11984589

申请日：2007-11-20

申请人： Yukinori Aburatani

发明人： Yukinori Aburatani

IPC分类号： H01L21/67

CPC分类号： H01L21/67775 ,  H01L21/67766 ,  H01L21/67769 ,  H01L21/67772 ,  H01L21/67778 ,  Y10T29/41

摘要： A substrate processing apparatus comprises a storage container for storing multiple substrates and whose substrate loading and unloading opening is shut by a lid, a loading and unloading port for carrying the storage container into and out of the case, a placement unit for placing the storage container in the loading and unloading port, a storage chamber provided adjacent to the loading and unloading port for storing the storage container, an opening and closing device for opening and closing the substrate loading and unloading opening of the storage container placed in the placement unit, a transfer device containing a holding mechanism for supporting the bottom of the storage container and transferring the storage container supported in the holding mechanism, over the opening and closing device between the inside and outside of the storage chamber, and an elevator mechanism for raising and lowering the placement unit between the placement unit height position where the opening and closing device opens and closes the storage container, and a height position where the transfer device gives and receives the storage container.

摘要翻译： 一种基板处理装置，包括：存储多个基板的存储容器，其基板装卸开口由盖关闭;用于将存放容器搬入和移出的装卸口;存放容器 在装卸口中设有与装卸装置相邻的存放容器的储存室，用于打开和关闭放置在放置单元中的储存容器的基板装载和卸载开口的打开和关闭装置， 传送装置，其具有用于支撑储存容器底部的保持机构，并且将支撑在保持机构中的存储容器转移到储存室的内部和外部之间的开闭装置上;以及升降机构，用于升高和降低 放置单元之间的位置单位高度位置开口和cl 打开和关闭存储容器以及传送装置给出和接收存储容器的高度位置。