A method for constructing a magnetic write head using an electrical lapping guide to carefully control critical dimensions dining a lapping operation used to define an air bearing surface. The lapping guide is photolithographically patterned in a common photolithographic step with another write head structure so that special relation between the lapping guide and critical dimensions of the write head structure can be carefully maintained. For example, the electrical lapping guide can be patterned in a common photolithographic step as the write pole so that the location of the flare point can he carefully controlled with respect to the location of the lapping guide. A stitched flare structure can also be built together with the electrical lapping guide, then a self-aligned shield can be further built over this stitched flare structure so that both flare point and shield throat can be controlled tightly together by this electrical lapping guide during lapping process. Similarly, the lapping guide can be formed in a common photolithographic step with a trailing shield, so that a critical dimension such as throat height of the trailing shield can be carefully controlled with respect to the electrical lapping guide.