发明申请
- 专利标题： LOCAL PLASMA PROCESSING
- 专利标题（中）： 本地等离子体处理
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申请号： US12041782申请日： 2008-03-04
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公开(公告)号： US20080146040A1公开(公告)日： 2008-06-19
- 发明人: Jeffrey P. Gambino , Thomas L. McDevitt , Anthony K. Stamper
- 申请人： Jeffrey P. Gambino , Thomas L. McDevitt , Anthony K. Stamper
- 主分类号： H01L21/31
- IPC分类号： H01L21/31
摘要：
A method and an apparatus for performing the method. The method includes: (a) providing an apparatus, wherein the apparatus comprises (i) a chamber, (ii) a plasma device being in and coupled to the chamber, (iii) a shower head being in and coupled to the chamber, and (iv) a chuck being in and coupled to the chamber; (b) placing the substrate on the chuck; (c) using the plasma device to receive a plasma device gas and generate a plasma; (d) directing the plasma at a pre-specified area on the substrate; and (e) using the shower head to receive and distribute a shower head gas in the chamber, wherein the plasma device gas and the shower head gas are selected such that the plasma and the shower head gas when mixed with each other result in a chemical reaction that forms a film at the pre-specified area on the substrate.