发明申请
US20080150044A1 THIN-FILM TRANSISTOR, THIN-FILM TRANSISTOR SHEET AND THEIR MANUFACTURING METHOD 有权
薄膜晶体管,薄膜晶体管片及其制造方法

  • 专利标题: THIN-FILM TRANSISTOR, THIN-FILM TRANSISTOR SHEET AND THEIR MANUFACTURING METHOD
  • 专利标题(中): 薄膜晶体管,薄膜晶体管片及其制造方法
  • 申请号: US12039875
    申请日: 2008-02-29
  • 公开(公告)号: US20080150044A1
    公开(公告)日: 2008-06-26
  • 发明人: Katsura Hirai
  • 申请人: Katsura Hirai
  • 申请人地址: JP Tokyo
  • 专利权人: KONICA MINOLTA HOLDINGS
  • 当前专利权人: KONICA MINOLTA HOLDINGS
  • 当前专利权人地址: JP Tokyo
  • 优先权: JP2003-079514 20030324
  • 主分类号: H01L27/12
  • IPC分类号: H01L27/12
THIN-FILM TRANSISTOR, THIN-FILM TRANSISTOR SHEET AND THEIR MANUFACTURING METHOD
摘要:
Disclosed are a process of manufacturing a thin-film transistor sheet and a thin-film transistor sheet manufactured by the process, the process comprising the steps of providing a gate busline on a substrate, providing, on the surface of the substrate on the gate busline side, an insulation layer capable of receiving a fluid electrode material, supply the fluid electrode material to the insulation layer, the fluid electrode material being allowed to permeate the insulation layer, forming a gate electrode from the permeated fluid electrode material to be in contact with the gate busline, forming a gate insulating layer on the gate electrode, and forming a semiconductor layer on the gate insulating layer.
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