发明申请
- 专利标题： Substrate support and lithographic process
- 专利标题（中）： 基板支撑和光刻工艺
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申请号： US12000100申请日： 2007-12-07
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公开(公告)号： US20080158526A1公开(公告)日： 2008-07-03
- 发明人: Pieter Renaat Maria Hennus , Frits Van Der Meulen , Joost Jeroen Ottens , Peter Paul Steijaert , Hubert Matthieu Richard Steijns , Peter Smits
- 申请人： Pieter Renaat Maria Hennus , Frits Van Der Meulen , Joost Jeroen Ottens , Peter Paul Steijaert , Hubert Matthieu Richard Steijns , Peter Smits
- 申请人地址： NL Veldhoven
- 专利权人： ASML NETHERLANDS B.V.
- 当前专利权人： ASML NETHERLANDS B.V.
- 当前专利权人地址： NL Veldhoven
- 主分类号： G03B27/52
- IPC分类号： G03B27/52
摘要：
A substrate support constructed to support a substrate for immersion lithographic processing is disclosed. The substrate support has a central part and a peripheral part positioned around the central part. The substrate support further includes a thermal decoupler arranged to decrease heat transport between the central part and the peripheral part.
公开/授权文献
- US07791709B2 Substrate support and lithographic process 公开/授权日：2010-09-07
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