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公开(公告)号：US20080137055A1
公开(公告)日：2008-06-12
申请号：US11635789
申请日：2006-12-08
申请人： Pieter Renaat Maria Hennus , Frits Van Der Meulen , Joost Jeroen Ottens , Peter Paul Steijaert , Hubert Matthieu Richard Steijns , Peter Smits
发明人： Pieter Renaat Maria Hennus , Frits Van Der Meulen , Joost Jeroen Ottens , Peter Paul Steijaert , Hubert Matthieu Richard Steijns , Peter Smits
IPC分类号： G03B27/58
CPC分类号： G03F7/70875 , G03F7/70341 , G03F7/707
摘要： A substrate support constructed to support a substrate for immersion lithographic processing is disclosed. The substrate support has a central part and a peripheral part, the peripheral part comprising an extraction duct configured to extract a liquid from a top surface of the substrate support, the extraction duct connected to an exit duct configured to duct the liquid away from the substrate support. The substrate support further includes a thermal stabilizer, arranged in the peripheral part, configured to thermally stabilize a central part of the substrate support relative to the peripheral part.
摘要翻译： 公开了一种用于支撑用于浸没式光刻处理的衬底的衬底支撑件。 衬底支撑件具有中心部分和周边部分，周边部分包括提取管道，其被配置为从衬底支撑件的顶表面提取液体，所述抽出管道连接到出口管道，该出口管道构造成将液体导管远离衬底 支持。 衬底支撑件还包括设置在周边部分中的热稳定器，其被配置为相对于周边部分热稳定衬底支撑件的中心部分。
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公开(公告)号：US07791709B2
公开(公告)日：2010-09-07
申请号：US12000100
申请日：2007-12-07
申请人： Pieter Renaat Maria Hennus , Frits Van Der Meulen , Joost Jeroen Ottens , Peter Paul Steijaert , Hubert Matthieu Richard Steijns , Peter Smits
发明人： Pieter Renaat Maria Hennus , Frits Van Der Meulen , Joost Jeroen Ottens , Peter Paul Steijaert , Hubert Matthieu Richard Steijns , Peter Smits
CPC分类号： G03F7/70875 , G03F7/70341 , G03F7/707
摘要： A substrate support constructed to support a substrate for immersion lithographic processing is disclosed. The substrate support has a central part and a peripheral part positioned around the central part. The substrate support further includes a thermal decoupler arranged to decrease heat transport between the central part and the peripheral part.
摘要翻译： 公开了一种用于支撑用于浸没式光刻处理的衬底的衬底支撑件。 基板支撑件具有围绕中心部分定位的中心部分和周边部分。 衬底支撑件还包括布置成减小中心部分和周边部分之间的热传递的热分离器。
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公开(公告)号：US20080158526A1
公开(公告)日：2008-07-03
申请号：US12000100
申请日：2007-12-07
申请人： Pieter Renaat Maria Hennus , Frits Van Der Meulen , Joost Jeroen Ottens , Peter Paul Steijaert , Hubert Matthieu Richard Steijns , Peter Smits
发明人： Pieter Renaat Maria Hennus , Frits Van Der Meulen , Joost Jeroen Ottens , Peter Paul Steijaert , Hubert Matthieu Richard Steijns , Peter Smits
IPC分类号： G03B27/52
CPC分类号： G03F7/70875 , G03F7/70341 , G03F7/707
摘要： A substrate support constructed to support a substrate for immersion lithographic processing is disclosed. The substrate support has a central part and a peripheral part positioned around the central part. The substrate support further includes a thermal decoupler arranged to decrease heat transport between the central part and the peripheral part.
摘要翻译： 公开了一种用于支撑用于浸没式光刻处理的衬底的衬底支撑件。 基板支撑件具有围绕中心部分定位的中心部分和周边部分。 衬底支撑件还包括布置成减小中心部分和周边部分之间的热传递的热分离器。
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公开(公告)号：US07365827B2
公开(公告)日：2008-04-29
申请号：US11006550
申请日：2004-12-08
申请人： Pieter Renaat Maria Hennus , Jeroen Johannes Sophia Mara Mertens , Patrick Johannes Cornelus Hendrik Smulders , Peter Smits
发明人： Pieter Renaat Maria Hennus , Jeroen Johannes Sophia Mara Mertens , Patrick Johannes Cornelus Hendrik Smulders , Peter Smits
IPC分类号： G03B27/42
CPC分类号： G03F7/70341 , G03F7/707 , G03F7/70808 , G03F7/7085 , G03F7/709
摘要： A lithographic apparatus for immersion lithography is disclosed in which a seal between different parts of the substrate table may be arranged to reduce the transmission of forces between the different parts.
摘要翻译： 公开了一种用于浸没式光刻的光刻设备，其中可以布置衬底台的不同部分之间的密封以减少不同部件之间的力的传递。
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公开(公告)号：US08860926B2
公开(公告)日：2014-10-14
申请号：US13240650
申请日：2011-09-22
申请人： Pieter Renaat Maria Hennus , Jeroen Johannes Sophia Maria Mertens , Patrick Johannes Cornelus Hendrik Smulders , Peter Smits
发明人： Pieter Renaat Maria Hennus , Jeroen Johannes Sophia Maria Mertens , Patrick Johannes Cornelus Hendrik Smulders , Peter Smits
IPC分类号： G03F7/20
CPC分类号： G03F7/70341 , G03F7/707 , G03F7/70808 , G03F7/7085 , G03F7/709
摘要： A lithographic apparatus for immersion lithography is disclosed in which a seal between different parts of the substrate table may be arranged to reduce the transmission of forces between the different parts.
摘要翻译： 公开了一种用于浸没式光刻的光刻设备，其中可以布置衬底台的不同部分之间的密封以减少不同部件之间的力的传递。
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公开(公告)号：US08115905B2
公开(公告)日：2012-02-14
申请号：US12076731
申请日：2008-03-21
申请人： Pieter Renaat Maria Hennus , Jeroen Johannes Sophia Maria Mertens , Patrick Johannes Cornelus Hendrik Smulders , Peter Smits
发明人： Pieter Renaat Maria Hennus , Jeroen Johannes Sophia Maria Mertens , Patrick Johannes Cornelus Hendrik Smulders , Peter Smits
CPC分类号： G03F7/70341 , G03F7/707 , G03F7/70808 , G03F7/7085 , G03F7/709
摘要： A lithographic apparatus for immersion lithography is disclosed in which a seal between different parts of the substrate table may be arranged to reduce the transmission of forces between the different parts.
摘要翻译： 公开了一种用于浸没式光刻的光刻设备，其中可以布置衬底台的不同部分之间的密封以减少不同部件之间的力的传递。
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公开(公告)号：US08269949B2
公开(公告)日：2012-09-18
申请号：US12563838
申请日：2009-09-21
申请人： Marcus Martinus Petrus Adrianus Vermeulen , Andre Bernardus Jeunink , Erik Roelof Loopstra , Joost Jeroen Ottens , Rene Theodorus Petrus Compen , Peter Smits , Martijn Houben , Hendrikus Johannes Marinus Van Abeelen , Antonius Arnoldus Meulendijks , Rene Wilhelmus Antonius Hubertus Leenaars
发明人： Marcus Martinus Petrus Adrianus Vermeulen , Andre Bernardus Jeunink , Erik Roelof Loopstra , Joost Jeroen Ottens , Rene Theodorus Petrus Compen , Peter Smits , Martijn Houben , Hendrikus Johannes Marinus Van Abeelen , Antonius Arnoldus Meulendijks , Rene Wilhelmus Antonius Hubertus Leenaars
CPC分类号： G03F7/70716 , G03F7/70775
摘要： A lithographic apparatus includes an illumination system configured to condition a radiation beam; a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; a mirror block provided with a substrate table constructed to hold a substrate; and a projection system configured to project the patterned radiation beam onto a target portion of the substrate, wherein the mirror block is constructed and arranged to reduce slip between the mirror block and the substrate table. Slip can occur if the acceleration of the mirror block is high and the substrate table slips locally with respect to the mirror block. Slip may lead to exposure errors since the position of the substrate is no longer determined with the desired accuracy.
摘要翻译： 光刻设备包括被配置为调节辐射束的照明系统; 构造成支撑图案形成装置的支撑件，所述图案形成装置能够在其横截面中赋予辐射束图案以形成图案化的辐射束; 设置有构造成保持基板的基板台的反射镜块; 以及投影系统，被配置为将所述图案化的辐射束投影到所述基板的目标部分上，其中所述反射镜块被构造和布置成减小所述反射镜块和所述基板台之间的滑动。 如果镜面块的加速度高，并且衬底台相对于镜面块局部滑动，则可能发生滑移。 滑动可能导致曝光误差，因为不再以所需精度确定基板的位置。
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公开(公告)号：US20110090474A1
公开(公告)日：2011-04-21
申请号：US12980406
申请日：2010-12-29
申请人： Hans JANSEN , Sebastiaan Maria Johannes Cornelissen , Sjoerd Nicolaas Lambertus Donders , Roelof Frederik De Graaf , Christiaan Alexander Hoogendam , Hernes Jacobs , Martinus Hendrikus Antonius Leenders , Jeroen Johannes Sophia Maria Mertens , Bob Streefkerk , Jan-Gerard Cornelis Van Der Toorn , Peter Smits , Franciscus Johannes Joseph Janssen , Michel Riepen
发明人： Hans JANSEN , Sebastiaan Maria Johannes Cornelissen , Sjoerd Nicolaas Lambertus Donders , Roelof Frederik De Graaf , Christiaan Alexander Hoogendam , Hernes Jacobs , Martinus Hendrikus Antonius Leenders , Jeroen Johannes Sophia Maria Mertens , Bob Streefkerk , Jan-Gerard Cornelis Van Der Toorn , Peter Smits , Franciscus Johannes Joseph Janssen , Michel Riepen
IPC分类号： G03B27/52
CPC分类号： G03F7/70341 , G03F7/707
摘要： In an immersion lithographic apparatus, bubble formation in immersion liquid is reduced or prevented by reducing a gap size or area on a substrate table and/or covering the gap.
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公开(公告)号：US07633073B2
公开(公告)日：2009-12-15
申请号：US11285774
申请日：2005-11-23
申请人： Hans Jansen , Sebastiaan Maria Johannes Cornelissen , Sjoerd Nicolaas Lambertus Donders , Roelof Frederik De Graaf , Christiaan Alexander Hoogendam , Hernes Jacobs , Martinus Hendrikus Antonius Leenders , Jeroen Johannes Sophia Maria Mertens , Jan-Gerard Cornelis Van Der Toorn , Peter Smits , Franciscus Johannes Joseph Janssen , Michel Riepen , Bob Streefkerk
发明人： Hans Jansen , Sebastiaan Maria Johannes Cornelissen , Sjoerd Nicolaas Lambertus Donders , Roelof Frederik De Graaf , Christiaan Alexander Hoogendam , Hernes Jacobs , Martinus Hendrikus Antonius Leenders , Jeroen Johannes Sophia Maria Mertens , Jan-Gerard Cornelis Van Der Toorn , Peter Smits , Franciscus Johannes Joseph Janssen , Michel Riepen , Bob Streefkerk
IPC分类号： G03F7/20
CPC分类号： G03F7/70341 , G03F7/707
摘要： In an immersion lithographic apparatus, bubble formation in immersion liquid is reduced or prevented by reducing a gap size or area on a substrate table and/or covering the gap.
摘要翻译： 在浸没式光刻设备中，通过减小衬底台上的间隙尺寸或面积和/或覆盖间隙来降低或防止浸没液中的气泡形成。
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公开(公告)号：US20090279064A1
公开(公告)日：2009-11-12
申请号：US12506643
申请日：2009-07-21
CPC分类号： G03F7/70341 , G03F7/70716
摘要： In an immersion lithographic apparatus, a closing plate is used to contain liquid in a liquid confinement structure while, for example, substrates are swapped on a substrate table. A closing plate displacement mechanism using, for example, a combination of one or more leaf springs and one or more electromagnets or a combination of one or more linear actuators and one more pins, is used to move the closing plate toward or from the liquid confinement structure. In an embodiment, an adjustment plate is used to compensate for closing plates of varying thickness in closing plate receptacles of varying depth on different substrate tables.
摘要翻译： 在浸没式光刻设备中，封闭板用于在液体限制结构中容纳液体，而例如将基板交换在基板台上。 使用例如使用一个或多个板簧和一个或多个电磁体的组合或者一个或多个线性致动器和多个销的组合的闭合板位移机构来移动封闭板朝向或从液体限制 结构体。 在一个实施例中，调节板用于补偿不同基底台上不同深度的封闭板插座中不同厚度的封闭板。
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