发明申请
US20080158538A1 Lithographic apparatus, substrate table, and method for enhancing substrate release properties
有权
平版印刷装置，基板台，以及增强基板剥离性能的方法
- 专利标题： Lithographic apparatus, substrate table, and method for enhancing substrate release properties
- 专利标题（中）： 平版印刷装置，基板台，以及增强基板剥离性能的方法
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申请号： US11645812申请日： 2006-12-27
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公开(公告)号： US20080158538A1公开(公告)日： 2008-07-03
- 发明人: Michiel Puyt , Arno Jan Bleeker , Johannes Hendrikus Gertrudis Franssen , Rene Theodorus Petrus Compen , Johannes Theodorus Guillielmus Maria Van De Ven , Egbert Dirk Stam , Rudolf Hartmut Fischer , Edwin Robert Martin Gelinck
- 申请人： Michiel Puyt , Arno Jan Bleeker , Johannes Hendrikus Gertrudis Franssen , Rene Theodorus Petrus Compen , Johannes Theodorus Guillielmus Maria Van De Ven , Egbert Dirk Stam , Rudolf Hartmut Fischer , Edwin Robert Martin Gelinck
- 申请人地址： NL Veldhoven
- 专利权人： ASML NETHERLANDS B.V.
- 当前专利权人： ASML NETHERLANDS B.V.
- 当前专利权人地址： NL Veldhoven
- 主分类号： G03B27/58
- IPC分类号： G03B27/58
摘要：
A lithographic apparatus includes an illumination system constructed and arranged to condition a radiation beam, and a support constructed and arranged to support a patterning device. The patterning device is capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam. The apparatus also includes a substrate table constructed and arranged to hold a substrate, and a projection system constructed and arranged to project the patterned radiation beam onto a target portion of the substrate. The substrate table includes a chuck having a plurality of protrusions constructed and arranged to support corresponding parts of a bottom surface of a wafer. The top surface of at least one of the protrusions includes a plurality of elements that define a reduced contact area between the substrate and the top surface of the protrusion.
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