发明申请
- 专利标题： Method of manufacturing aluminum and aluminum alloy sputtering targets
- 专利标题（中）： 铝和铝合金溅射靶的制造方法
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申请号： US12071935申请日： 2008-02-28
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公开(公告)号： US20080190764A1公开(公告)日： 2008-08-14
- 发明人: Shan Torng , Chune-Ching Young , Shih-Ying Chen , Po-Chun Hsu , Chia-Hsiang Peng , Fan-Chun Tseng , Ren-An Luo
- 申请人： Shan Torng , Chune-Ching Young , Shih-Ying Chen , Po-Chun Hsu , Chia-Hsiang Peng , Fan-Chun Tseng , Ren-An Luo
- 优先权： TW094145170 20051220
- 主分类号： C23C14/14
- IPC分类号： C23C14/14
摘要：
A manufacturing method of sputtering targets uses a direct-chill method to fabricate various aluminum and aluminum alloy ingots. Without the need of follow-up forging processes, the fabricated aluminum alloy ingots can be cut to attain aluminum and aluminum alloy sputtering targets. The method according to the present invention features the advantages of few process steps, high productivity, and high yield. In addition, the fabricated targets have small grains, fine precipitate phases, and homogeneous composition.
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