公开(公告)号：US20070137831A1

公开(公告)日：2007-06-21

申请号：US11411757

申请日：2006-04-27

申请人： Shan Torng ,  Chune-Ching Young ,  Shih-Ying Chen ,  Po-Chun Hsu ,  Chia-Hsiang Peng ,  Fan-Chun Tseng ,  Ren-An Luo

发明人： Shan Torng ,  Chune-Ching Young ,  Shih-Ying Chen ,  Po-Chun Hsu ,  Chia-Hsiang Peng ,  Fan-Chun Tseng ,  Ren-An Luo

IPC分类号： B22D11/124

CPC分类号： B22D21/007 ,  B22D11/003 ,  C23C14/3414

摘要： A manufacturing method of sputtering targets uses a direct-chill method to fabricate various aluminum and aluminum alloy ingots. Without the need of follow-up forging processes, the fabricated aluminum alloy ingots can be cut to attain aluminum and aluminum alloy sputtering targets. The method according to the present invention features the advantages of few process steps, high productivity, and high yield. In addition, the fabricated targets have small grains, fine precipitate phases, and homogeneous composition.

摘要翻译： 溅射靶的制造方法采用直接冷却法制造各种铝和铝合金锭。 不需要后续锻造工艺，可以将所制造的铝合金锭切割成铝和铝合金溅射靶。 根据本发明的方法具有工艺步骤少，生产率高，产率高的优点。 此外，所制造的靶材具有小晶粒，细沉淀相和均匀的组成。

公开(公告)号：US20080190764A1

公开(公告)日：2008-08-14

申请号：US12071935

申请日：2008-02-28

申请人： Shan Torng ,  Chune-Ching Young ,  Shih-Ying Chen ,  Po-Chun Hsu ,  Chia-Hsiang Peng ,  Fan-Chun Tseng ,  Ren-An Luo

发明人： Shan Torng ,  Chune-Ching Young ,  Shih-Ying Chen ,  Po-Chun Hsu ,  Chia-Hsiang Peng ,  Fan-Chun Tseng ,  Ren-An Luo

IPC分类号： C23C14/14

CPC分类号： B22D21/007 ,  B22D11/003 ,  C23C14/3414

摘要： A manufacturing method of sputtering targets uses a direct-chill method to fabricate various aluminum and aluminum alloy ingots. Without the need of follow-up forging processes, the fabricated aluminum alloy ingots can be cut to attain aluminum and aluminum alloy sputtering targets. The method according to the present invention features the advantages of few process steps, high productivity, and high yield. In addition, the fabricated targets have small grains, fine precipitate phases, and homogeneous composition.

摘要翻译： 溅射靶的制造方法采用直接冷却法制造各种铝和铝合金锭。 不需要后续锻造工艺，可以将所制造的铝合金锭切割成铝和铝合金溅射靶。 根据本发明的方法具有工艺步骤少，生产率高，产率高的优点。 此外，所制造的靶材具有小晶粒，细沉淀相和均匀的组成。

公开(公告)号：US20130269480A1

公开(公告)日：2013-10-17

申请号：US13447335

申请日：2012-04-16

申请人： Chang-Chuan Hsu ,  Shan Torng ,  Sy-Cherng Yang ,  Fan-Chun Tseng ,  Wei-Ming Huang ,  Ren-An Luo

发明人： Chang-Chuan Hsu ,  Shan Torng ,  Sy-Cherng Yang ,  Fan-Chun Tseng ,  Wei-Ming Huang ,  Ren-An Luo

IPC分类号： C22C1/02 ,  B22D25/00 ,  C22B4/02

CPC分类号： C22C21/02 ,  B22D11/003 ,  B22D11/049 ,  C22C1/026

摘要： A method is used to make an aluminum alloy with excellent tensile strength, low density and excellent radiation. The method includes the steps of providing a base material, adding 0.06 wt % to 0.30 wt % of zirconium and 0.06 wt % to 0.30 wt % of vanadium to the base material, and melting the basic material with the zirconium and vanadium to provide an aluminum alloy. The base material includes 92.55 wt % to 97.38 wt % of aluminum, 0.9 wt % to 1.8 wt % of silicon, less than 0.5 wt % of iron, 0.6 wt % to 1.2 wt % of copper, 0.4 wt % to 1.1 wt % of manganese, 0.6 wt % to 1.4 wt % of magnesium, less than 0.40 wt % of chromium, less than 0.25 wt % of zinc and less than 0.20 wt % of titanium.

摘要翻译： 一种用于制造具有优异拉伸强度，低密度和优异辐射的铝合金的方法。 该方法包括以下步骤：向基材提供添加0.06重量％至0.30重量％的锆和0.06重量％至0.30重量％的钒的基材，并用锆和钒熔化碱性材料以提供铝 合金。 该基材包括92.55重量％至97.38重量％的铝，0.9重量％至1.8重量％的硅，小于0.5重量％的铁，0.6重量％至1.2重量％的铜，0.4重量％至1.1重量％的 锰，0.6重量％至1.4重量％的镁，小于0.40重量％的铬，小于0.25重量％的锌和小于0.20重量％的钛。