公开(公告)号：US20080190764A1

公开(公告)日：2008-08-14

申请号：US12071935

申请日：2008-02-28

申请人： Shan Torng ,  Chune-Ching Young ,  Shih-Ying Chen ,  Po-Chun Hsu ,  Chia-Hsiang Peng ,  Fan-Chun Tseng ,  Ren-An Luo

发明人： Shan Torng ,  Chune-Ching Young ,  Shih-Ying Chen ,  Po-Chun Hsu ,  Chia-Hsiang Peng ,  Fan-Chun Tseng ,  Ren-An Luo

IPC分类号： C23C14/14

CPC分类号： B22D21/007 ,  B22D11/003 ,  C23C14/3414

摘要： A manufacturing method of sputtering targets uses a direct-chill method to fabricate various aluminum and aluminum alloy ingots. Without the need of follow-up forging processes, the fabricated aluminum alloy ingots can be cut to attain aluminum and aluminum alloy sputtering targets. The method according to the present invention features the advantages of few process steps, high productivity, and high yield. In addition, the fabricated targets have small grains, fine precipitate phases, and homogeneous composition.

摘要翻译： 溅射靶的制造方法采用直接冷却法制造各种铝和铝合金锭。 不需要后续锻造工艺，可以将所制造的铝合金锭切割成铝和铝合金溅射靶。 根据本发明的方法具有工艺步骤少，生产率高，产率高的优点。 此外，所制造的靶材具有小晶粒，细沉淀相和均匀的组成。

公开(公告)号：US20090136379A1

公开(公告)日：2009-05-28

申请号：US11946323

申请日：2007-11-28

申请人： Shan Torng ,  Chune-Ching Young ,  Chia-Ming O ,  Wei-Pirn Hong

发明人： Shan Torng ,  Chune-Ching Young ,  Chia-Ming O ,  Wei-Pirn Hong

IPC分类号： C22C23/00

CPC分类号： C22F1/06 ,  B21C23/06 ,  B21C35/023 ,  C22C23/00

摘要： A manufacturing method for wide-range fine-grained magnesium alloy thin-sheet material is disclosed. The method includes an extrusion process and a rolling process. By the plastic deformation feature of the two processes, the wide-range fine-grained magnesium alloy thin-sheet material that satisfies the requirement of cases of 3C products with thickness of less than 1 mm is produced. Thus the method overcomes shortcomings of a conventional method that produces the material by a plurality passes of processes. Therefore, the manufacturing cost is reduced and the method is able to be applied to various industries.

摘要翻译： 公开了一种宽范围细粒度镁合金薄片材料的制造方法。 该方法包括挤压工艺和轧制过程。 通过两种工艺的塑性变形特征，制造出满足3C产品厚度小于1毫米的要求的宽范围细粒度镁合金薄片材料。 因此，该方法克服了通过多道工艺产生材料的常规方法的缺点。 因此，制造成本降低，该方法能够应用于各行业。

公开(公告)号：US20070137831A1

公开(公告)日：2007-06-21

申请号：US11411757

申请日：2006-04-27

申请人： Shan Torng ,  Chune-Ching Young ,  Shih-Ying Chen ,  Po-Chun Hsu ,  Chia-Hsiang Peng ,  Fan-Chun Tseng ,  Ren-An Luo

发明人： Shan Torng ,  Chune-Ching Young ,  Shih-Ying Chen ,  Po-Chun Hsu ,  Chia-Hsiang Peng ,  Fan-Chun Tseng ,  Ren-An Luo

IPC分类号： B22D11/124

CPC分类号： B22D21/007 ,  B22D11/003 ,  C23C14/3414

摘要： A manufacturing method of sputtering targets uses a direct-chill method to fabricate various aluminum and aluminum alloy ingots. Without the need of follow-up forging processes, the fabricated aluminum alloy ingots can be cut to attain aluminum and aluminum alloy sputtering targets. The method according to the present invention features the advantages of few process steps, high productivity, and high yield. In addition, the fabricated targets have small grains, fine precipitate phases, and homogeneous composition.

摘要翻译： 溅射靶的制造方法采用直接冷却法制造各种铝和铝合金锭。 不需要后续锻造工艺，可以将所制造的铝合金锭切割成铝和铝合金溅射靶。 根据本发明的方法具有工艺步骤少，生产率高，产率高的优点。 此外，所制造的靶材具有小晶粒，细沉淀相和均匀的组成。