发明申请
US20080198891A1 Excimer laser device operable at high repetition rate and having high band-narrowing efficiency 有权
准分子激光装置可以高重复率操作并且具有高带窄效率

  • 专利标题: Excimer laser device operable at high repetition rate and having high band-narrowing efficiency
  • 专利标题(中): 准分子激光装置可以高重复率操作并且具有高带窄效率
  • 申请号: US12071048
    申请日: 2008-02-14
  • 公开(公告)号: US20080198891A1
    公开(公告)日: 2008-08-21
  • 发明人: Tsukasa HoriTakanobu IshiharaKouji Kakizaki
  • 申请人: Tsukasa HoriTakanobu IshiharaKouji Kakizaki
  • 优先权: JP2007-034777 20070215
  • 主分类号: H01S3/03
  • IPC分类号: H01S3/03
Excimer laser device operable at high repetition rate and having high band-narrowing efficiency
摘要:
A narrow-band discharge excited laser device including a laser chamber having a laser gas sealed therein, a pair of electrodes provided within the laser chamber to face each other with a predetermined distance therebetween, a band-narrowing module having a magnifying prism and a grating and receiving laser light passing through a slit, and a cross-flow fan circulating the laser gas passing between the electrodes, in which a pulsed voltage is applied from a high-voltage power supply to the pair of electrodes to generate electric discharge between the electrodes, and the pair of electrodes have a width of 1 to 2 mm, a ratio between the electrode width and the inter-electrode distance (electrode with inter-electrode distance) being 0.25 to 0.125.
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