发明申请
- 专利标题: Illumination System of a Microlithographic Exposure Apparatus
- 专利标题(中): 微光刻曝光设备的照明系统
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申请号: US11660754申请日: 2005-08-23
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公开(公告)号: US20080212327A1公开(公告)日: 2008-09-04
- 发明人: Wolfgang Singer , Johannes Wangler , Rafael Egger , Wilhelm Ulrich
- 申请人: Wolfgang Singer , Johannes Wangler , Rafael Egger , Wilhelm Ulrich
- 申请人地址: DE OBERKICHEN
- 专利权人: CARL ZEISS SMT AG
- 当前专利权人: CARL ZEISS SMT AG
- 当前专利权人地址: DE OBERKICHEN
- 国际申请: PCT/EP2005/009093 WO 20050823
- 主分类号: F21V7/00
- IPC分类号: F21V7/00
摘要:
An illumination system of a microlithographic exposure apparatus has an optical axis and a beam transforming device. This device includes a first mirror with a first reflective surface having a shape that is defined by rotating a straight line, which is inclined with respect to the optical axis, around the optical axis. The device further includes a second mirror with a second reflective surface having a shape that is defined by rotating a curved line around the optical axis. At least one of the mirrors has a central aperture containing the optical axis. This device may form a zoom-collimator for an EUV illumination system that transforms a diverging light bundle into a collimated light bundle of variable shape and/or diameter.