公开(公告)号：US08134687B2

公开(公告)日：2012-03-13

申请号：US11660754

申请日：2005-08-23

申请人： Wolfgang Singer ,  Johannes Wangler ,  Rafael Egger ,  Wilhelm Ulrich

发明人： Wolfgang Singer ,  Johannes Wangler ,  Rafael Egger ,  Wilhelm Ulrich

IPC分类号： G03B27/54 ,  G03B27/42

CPC分类号： G03F7/70108 ,  G03F7/70183

摘要： An illumination system of a microlithographic exposure apparatus has an optical axis and a beam transforming device. This device includes a first mirror with a first reflective surface having a shape that is defined by rotating a straight line, which is inclined with respect to the optical axis, around the optical axis. The device further includes a second mirror with a second reflective surface having a shape that is defined by rotating a curved line around the optical axis. At least one of the mirrors has a central aperture containing the optical axis. This device may form a zoom-collimator for an EUV illumination system that transforms a diverging light bundle into a collimated light bundle of variable shape and/or diameter.

摘要翻译： 微光刻曝光装置的照明系统具有光轴和光束变换装置。 该装置包括具有第一反射表面的第一反射镜，该第一反射表面具有围绕光轴旋转相对于光轴倾斜的直线所限定的形状。 该装置还包括具有第二反射表面的第二反射镜，其具有通过围绕光轴旋转曲线而限定的形状。 至少一个反射镜具有包含光轴的中心孔。 该装置可以形成EUV照明系统的变焦准直器，其将发散的光束变换成可变形状和/或直径的准直光束。

公开(公告)号：US20080212327A1

公开(公告)日：2008-09-04

申请号：US11660754

申请日：2005-08-23

申请人： Wolfgang Singer ,  Johannes Wangler ,  Rafael Egger ,  Wilhelm Ulrich

发明人： Wolfgang Singer ,  Johannes Wangler ,  Rafael Egger ,  Wilhelm Ulrich

IPC分类号： F21V7/00

CPC分类号： G03F7/70108 ,  G03F7/70183

摘要： An illumination system of a microlithographic exposure apparatus has an optical axis and a beam transforming device. This device includes a first mirror with a first reflective surface having a shape that is defined by rotating a straight line, which is inclined with respect to the optical axis, around the optical axis. The device further includes a second mirror with a second reflective surface having a shape that is defined by rotating a curved line around the optical axis. At least one of the mirrors has a central aperture containing the optical axis. This device may form a zoom-collimator for an EUV illumination system that transforms a diverging light bundle into a collimated light bundle of variable shape and/or diameter.

摘要翻译： 微光刻曝光装置的照明系统具有光轴和光束变换装置。 该装置包括具有第一反射表面的第一反射镜，该第一反射表面具有围绕光轴旋转相对于光轴倾斜的直线所限定的形状。 该装置还包括具有第二反射表面的第二反射镜，其具有通过围绕光轴旋转曲线而限定的形状。 至少一个反射镜具有包含光轴的中心孔。 该装置可以形成EUV照明系统的变焦准直器，其将发散的光束变换成可变形状和/或直径的准直光束。

公开(公告)号：US20050219495A1

公开(公告)日：2005-10-06

申请号：US11015312

申请日：2004-12-17

申请人： Wolfgang Singer ,  Markus Deguenther ,  Birgit Kuerz ,  Rafael Egger ,  Johannes Wangler ,  Manfred Maul

发明人： Wolfgang Singer ,  Markus Deguenther ,  Birgit Kuerz ,  Rafael Egger ,  Johannes Wangler ,  Manfred Maul

IPC分类号： G03B27/54 ,  G03F7/20

CPC分类号： G03F7/70108 ,  G03F7/70183

摘要： A beam reshaping unit for an illumination system (10) of a microlithographic projection exposure apparatus comprises a first beam reshaping element (62) having a first beam reshaping surface (68) and a second beam reshaping element having a second beam reshaping surface (74) which faces the first beam reshaping surface (68). The two beam reshaping surfaces (68; 74) are rotationally symmetrical with respect to an optical axis (22) of the beam reshaping unit. At least the first beam reshaping surface (68, 74) has a concavely or convexly curved region (70, 76).

摘要翻译： 用于微光刻投影曝光装置的照明系统（10）的光束整形单元包括具有第一光束重塑表面（68）的第一光束重塑元件（62）和具有第二光束重塑表面（74）的第二光束重塑元件， 其面向第一光束重塑表面（68）。 两个光束整形表面（68; 74）相对于光束整形单元的光轴（22）旋转对称。 至少第一光束整形表面（68,74）具有凹或凸弯曲的区域（70,76）。

公开(公告)号：US07542217B2

公开(公告)日：2009-06-02

申请号：US11015312

申请日：2004-12-17

申请人： Wolfgang Singer ,  Markus Deguenther ,  Birgit Kuerz ,  Rafael Egger ,  Johannes Wangler ,  Manfred Maul

发明人： Wolfgang Singer ,  Markus Deguenther ,  Birgit Kuerz ,  Rafael Egger ,  Johannes Wangler ,  Manfred Maul

IPC分类号： G02B13/08 ,  G02B3/02 ,  G02B9/00 ,  G02B3/00 ,  G03B27/54

CPC分类号： G03F7/70108 ,  G03F7/70183

摘要： A beam reshaping unit for an illumination system of a microlithographic projection exposure apparatus includes a first beam reshaping element having a first beam reshaping surface and a second beam reshaping element having a second beam reshaping surface which faces the first beam reshaping surface. The two beam reshaping surfaces are rotationally symmetrical with respect to an optical axis of the beam reshaping unit. At least the first beam reshaping surface has a concavely or convexly curved region.

摘要翻译： 用于微光刻投影曝光装置的照明系统的光束整形单元包括具有第一光束重塑表面的第一光束重塑元件和具有面向第一光束重塑表面的第二光束重塑表面的第二光束重塑元件。 两个光束整形表面相对于光束整形单元的光轴旋转对称。 至少第一光束整形表面具有凹或凸曲面的区域。

公开(公告)号：US20080192359A1

公开(公告)日：2008-08-14

申请号：US11911904

申请日：2006-04-26

申请人： Alexander Sohmer ,  Aurelian Dodoc ,  Heiko Feldmann ,  Wilhelm Ulrich ,  Gerhard Furter ,  Rafael Egger ,  Artur Hogele ,  Michael Raum

发明人： Alexander Sohmer ,  Aurelian Dodoc ,  Heiko Feldmann ,  Wilhelm Ulrich ,  Gerhard Furter ,  Rafael Egger ,  Artur Hogele ,  Michael Raum

IPC分类号： G02B27/18

CPC分类号： G03F7/70075 ,  G02B17/0892 ,  G02B27/0043

摘要： An illumination system (12) of a microlithographic exposure apparatus (10) comprises a condenser (601; 602; 603; 604; 605; 606) for transforming a pupil plane (54) into a field plane (62). The condenser has a lens group (L14, L15, L16, L17; L24, L25, L26, L27, L28; L34, L35, L36, L37; L44, L45, L46; L53, L54, L55) that contains a plurality of consecutive lenses. These lenses are arranged such that a light bundle (70) focused by the condenser (601; 602; 603; 604; 605) on an on-axis field point (72) converges within each lens of the lens group. At least one lens (L15, L16, L17; L25, L26; L34, L44, L45; L54) of the lens group has a concave surface. The illumination system may further comprise a field stop objective (66; 666, 666′) that at least partly corrects a residual pupil aberration of the condenser (601; 602; 603; 604; 605; 606).

摘要翻译： 微光刻曝光设备（10）的照明系统（12）包括用于将光瞳平面（54）变换成场平面（62）的冷凝器（601; 602; 603; 604; 605; 606）。 冷凝器具有透镜组（L 14，L 15，L 16，L 17; L 24，L 25，L 26，L 27，L 28; L 34，L 35，L 36，L 37; L 44，L 45，L 46; L 53，L 54，L 55）。 这些透镜被布置为使得在轴上场点（72）上由聚光器（601; 602; 603; 604; 605）聚焦的光束（70）会聚在透镜组的每个透镜内。 透镜组的至少一个透镜（L 15，L 16，L 17; L 25，L 26; L 34，L 44，L 45; L 54）具有凹面。 照明系统还可以包括至少部分校正冷凝器（601; 602; 603; 604; 605; 606）的残余光瞳像差的场停止物镜（66; 666,666'）。

公开(公告)号：US08873151B2

公开(公告)日：2014-10-28

申请号：US11911904

申请日：2006-04-26

申请人： Alexander Sohmer ,  Aurelian Dodoc ,  Heiko Feldmann ,  Wilhelm Ulrich ,  Gerhard Fuerter ,  Rafael Egger ,  Artur Moegele ,  Michael Raum

发明人： Alexander Sohmer ,  Aurelian Dodoc ,  Heiko Feldmann ,  Wilhelm Ulrich ,  Gerhard Fuerter ,  Rafael Egger ,  Artur Moegele ,  Michael Raum

IPC分类号： G02B3/00 ,  G03F7/20 ,  G02B17/08 ,  G02B27/00

CPC分类号： G03F7/70075 ,  G02B17/0892 ,  G02B27/0043

摘要： An illumination system of a microlithographic exposure apparatus comprises a condenser for transforming a pupil plane into a field plane. The condenser has a lens group that contains a plurality of consecutive lenses. These lenses are arranged such that a light bundle focused by the condenser on an on-axis field point converges within each lens of the lens group. At least one lens of the lens group has a concave surface. The illumination system may further comprise a field stop objective that at least partly corrects a residual pupil aberration of the condenser.

摘要翻译： 微光刻曝光设备的照明系统包括用于将光瞳平面转换成场平面的聚光器。 冷凝器具有包含多个连续透镜的透镜组。 这些透镜被布置成使得由聚光器聚焦在轴上场点上的光束在透镜组的每个透镜内会聚。 透镜组的至少一个透镜具有凹面。 照明系统还可以包括至少部分地校正冷凝器的残余光瞳像差的场停止物镜。

公开(公告)号：US08334522B2

公开(公告)日：2012-12-18

申请号：US12616811

申请日：2009-11-12

申请人： Rafael Egger

发明人： Rafael Egger

IPC分类号： F21V9/16 ,  G01J1/58 ,  G01T1/10 ,  G21H3/02 ,  G21K5/00 ,  H01J65/06 ,  H01J65/08

CPC分类号： G01N21/278 ,  G01N21/6428

摘要： The invention concerns methods and apparatuses for quantitatively determining the concentration of fluorophores of a substance in a sample. A constant portion of the reference light of a reference light wave length (λr) emitted by a reference light source is coupled in by an optical element in the direction of a receiving element. A first value corresponding to the portion of the reference light coupled in which is incident on the receiving element is detected. The sample is irradiated with the excitation light of an excitation wave length (λex) emitted by an excitation light source. A second value corresponding to the portion of the fluorescent light of an emission wave length (λem) emitted by the sample which is incident on the receiving element. The ratio of the second value to the first value is determined. The number of fluorophores in the substance is determined based on the ratio.

摘要翻译： 本发明涉及用于定量测定样品中物质的荧光团浓度的方法和装置。 由参考光源发射的参考光波长（λr）的参考光的恒定部分通过光学元件沿接收元件的方向耦合。 检测对应于其中入射在接收元件上的参考光的部分的第一值。 用激发光源发射的激发波长（λex）的激发光照射样品。 对应于由入射在接收元件上的样品发射的发射波长（λem）的荧光的部分的第二值。 确定第二值与第一值的比率。 该物质中荧光团的数量是根据比例来确定的。

公开(公告)号：US20090231718A1

公开(公告)日：2009-09-17

申请号：US12414303

申请日：2009-03-30

申请人： Holger Muenz ,  Alois Herkommer ,  Rafael Egger

发明人： Holger Muenz ,  Alois Herkommer ,  Rafael Egger

IPC分类号： G02B27/12 ,  G02B13/08 ,  G02B13/10

CPC分类号： G02B27/0927 ,  B23K26/0604 ,  B23K26/0608 ,  B23K26/066 ,  B23K26/067 ,  B23K26/0732 ,  B23K26/0738 ,  G02B27/0966

摘要： In one aspect, the disclosure features an optical system configured to create from a beam of light an intensity distribution on a surface, whereby the optical system comprises at least a first optical element which splits the incident beam into a plurality of beams some of which at least partially overlap in a first direction on said surface and whereby the optical system further comprises at least a second optical element which displaces at least one of said beams in a second direction on said surface.

摘要翻译： 在一个方面，本公开的特征在于一种光学系统，其被配置为从光束产生表面上的强度分布，由此光学系统包括至少第一光学元件，其将入射光束分成多个光束，其中一些光束 在所述表面上的第一方向上至少部分地重叠，由此所述光学系统还包括至少第二光学元件，所述第二光学元件在所述表面上沿第二方向移位所述光束中的至少一个。

公开(公告)号：US07538948B2

公开(公告)日：2009-05-26

申请号：US11318127

申请日：2005-12-22

申请人： Holger Muenz ,  Alois Herkommer ,  Rafael Egger

发明人： Holger Muenz ,  Alois Herkommer ,  Rafael Egger

IPC分类号： G02B27/10

CPC分类号： G02B27/0927 ,  B23K26/0604 ,  B23K26/0608 ,  B23K26/066 ,  B23K26/067 ,  B23K26/0732 ,  B23K26/0738 ,  G02B27/0966

摘要： In one aspect, the disclosure features an optical system configured to create from a beam of light an intensity distribution on a surface, whereby the optical system comprises at least a first optical element which splits the incident beam into a plurality of beams some of which at least partially overlap in a first direction on said surface and whereby the optical system further comprises at least a second optical element which displaces at least one of said beams in a second direction on said surface.

摘要翻译： 在一个方面，本公开的特征在于一种光学系统，其被配置为从光束产生表面上的强度分布，由此光学系统包括至少第一光学元件，其将入射光束分成多个光束，其中一些光束 在所述表面上的第一方向上至少部分地重叠，由此所述光学系统还包括至少第二光学元件，所述第二光学元件在所述表面上沿第二方向移位所述光束中的至少一个。

公开(公告)号：US08045172B2

公开(公告)日：2011-10-25

申请号：US12487912

申请日：2009-06-19

申请人： Rafael Egger

发明人： Rafael Egger

IPC分类号： G01N21/55

CPC分类号： G01N21/8483 ,  G01N21/314

摘要： In a method for determining the concentration of at least one substance in a liquid the liquid is applied onto a test strip containing at least one test zone, wherein an optical sensor arrangement is moved step-by-step in a first direction over the surface of the test strip while the test trip is at the same time irradiated with light of a predetermined wave length and wherein in each step the radiation reflected from the surface of the test strip is measured, and wherein in each measurement step the test strip surface is irradiated alternately with light of at least two different wave lengths and the irradiation is measured at the same time and the difference between the measurement signals obtained in each measurement step using irradiation light of different wave lengths is analyzed.

摘要翻译： 在用于确定液体中至少一种物质的浓度的方法中，将液体施加到含有至少一个测试区域的测试条上，其中光学传感器装置在第一方向上逐步移动到 测试条同时用预定波长的光照射，并且其中在每个步骤中测量从测试条表面反射的辐射，并且其中在每个测量步骤中辐射测试条表面 交替地具有至少两个不同波长的光，并且同时测量照射，并且分析使用不同波长的照射光在每个测量步骤中获得的测量信号之间的差。