发明申请
- 专利标题: RETICLE DEFECT INSPECTION APPARATUS AND RETICLE DEFECT INSPECTION METHOD
- 专利标题(中): 虚假检测装置和虚假检测方法
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申请号: US12047554申请日: 2008-03-13
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公开(公告)号: US20080239290A1公开(公告)日: 2008-10-02
- 发明人: Toshiyuki WATANABE , Riki Ogawa
- 申请人: Toshiyuki WATANABE , Riki Ogawa
- 申请人地址: JP Yokohama-shi
- 专利权人: Advanced Mask Inspection Technology, Inc.
- 当前专利权人: Advanced Mask Inspection Technology, Inc.
- 当前专利权人地址: JP Yokohama-shi
- 优先权: JP2007-090054 20070330
- 主分类号: G01N21/00
- IPC分类号: G01N21/00
摘要:
A reticle defect inspection apparatus that can carry out a defect inspection with high detection sensitivity are provided. The apparatus includes an optical system of transmitted illumination for irradiating one surface of a sample with a first inspection light, an optical system of reflected illumination for irradiating another surface of the sample with a second inspection light, and a detecting optical system that can simultaneously detect a transmitted light obtained by the first inspection light being passed through the sample and a reflected light obtained by the second inspection light being reflected by the sample. And the optical system of transmitted illumination includes a focusing lens driving mechanism for correcting a focal point shift of the transmitted light resulting from thickness of the sample.
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