发明申请
- 专利标题： POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME
- 专利标题（中）： 正极性组合物和使用其的图案形成方法
-
申请号： US12053675申请日： 2008-03-24
-
公开(公告)号： US20080241743A1公开(公告)日： 2008-10-02
- 发明人: Kazuyoshi Mizutani , Shuji Hirano , Shinichi Sugiyama
- 申请人： Kazuyoshi Mizutani , Shuji Hirano , Shinichi Sugiyama
- 申请人地址： JP Tokyo
- 专利权人： FUJIFILM Corporation
- 当前专利权人： FUJIFILM Corporation
- 当前专利权人地址： JP Tokyo
- 优先权： JP2007-081504 20070327; JP2008-004768 20080111
- 主分类号： G03F7/004
- IPC分类号： G03F7/004 ; G03F7/00
摘要：
A positive resist composition, includes: (B) a resin containing a repeating unit represented by formula (Ia) or (Ib) as defined in the specification, which decomposes under an action of an acid to increase a solubility of the resin (B) in an aqueous alkali solution; and (A) a compound capable of generating an acid upon irradiation with actinic rays or radiation, and a pattern forming method uses the composition.
公开/授权文献
信息查询
IPC分类:
