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1.发明授权Actinic ray-sensitive or radiation-sensitive resin composition and method of forming pattern therewith 有权光化射线敏感或辐射敏感性树脂组合物及其形成图案的方法公开(公告)号：US08349535B2
公开(公告)日：2013-01-08
申请号：US12895504
申请日：2010-09-30
申请人： Kana Fujii , Takamitsu Tomiga , Toru Tsuchihashi , Kazuyoshi Mizutani , Jiro Yokoyama , Shinichi Sugiyama , Shuji Hirano , Toru Fujimori
发明人： Kana Fujii , Takamitsu Tomiga , Toru Tsuchihashi , Kazuyoshi Mizutani , Jiro Yokoyama , Shinichi Sugiyama , Shuji Hirano , Toru Fujimori
CPC分类号： G03F7/0392 , C08F8/12 , C08F12/22 , C08F214/18 , C08F220/18 , C08F220/22 , C08F220/32 , C08F2220/282 , C08K5/375 , C08K5/42 , C08L33/068 , C08L51/04 , C08L67/02 , C09D125/14 , C09D125/18 , G03F7/0045 , G03F7/0046 , C08F212/14 , C08F2220/1825 , C08F2220/185 , C08F220/14
摘要： According to one embodiment, an actinic ray-sensitive or radiation-sensitive resin composition includes (A) a resin containing the repeating units of formulae (I), (II) and (III) that when acted on by an acid, becomes soluble in an alkali developer, and (B) a compound that when irradiated with actinic rays or radiation, generates a fluorine-containing acid, wherein each of R1 independently represents a hydrogen atom or an optionally substituted methyl group, R2 represents a halogen atom, an optionally substituted alkyl group, an optionally substituted cycloalkyl group, an optionally substituted aryl group or an optionally substituted aralkyl group, and n is an integer of 0 to 5, provided that when n is 2 or greater, multiple R2s may be identical to or different from each other.
摘要翻译： 根据一个实施方案，光化射线敏感或辐射敏感性树脂组合物包含（A）含有式（I），（II）和（III）的重复单元的树脂，当被酸作用时，其变得可溶于 碱显影剂和（B）当用光化射线或辐射照射时产生含氟酸的化合物，其中R 1各自独立地表示氢原子或任选取代的甲基，R 2表示卤素原子，任选地 取代的烷基，任选取代的环烷基，任选取代的芳基或任选取代的芳烷基，n为0至5的整数，条件是当n为2或更大时，多个R 2可以相同或不同 彼此。
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公开(公告)号：US07989137B2
公开(公告)日：2011-08-02
申请号：US12238856
申请日：2008-09-26
CPC分类号： G03F7/0392 , G03F7/0397 , Y10S430/106 , Y10S430/111
摘要： A resist composition includes (A) a resin including: a repeating unit capable of decomposing by the action of an acid to increase solubility in an alkali developing solution and represented by formula (I), and a repeating unit represented by formula (II); and (B) a compound capable of generating an acid upon irradiation with actinic ray or radiation: wherein A represents a hydrogen atom, an alkyl group, a hydroxyl group, an alkoxyl group, a halogen atom, a cyano group, a nitro group, an acyl group, an acyloxy group, a cycloalkyl group, an aryl group, a carboxyl group, an alkyloxycarbonyl group, an alkylcarbonyloxy group, or an aralkyl group; Ra represents a group containing a group capable of decomposing by the action of an acid; Rb represents an alkylene group, a cycloalkylene group, or a group of combining these groups; Y represents a heterocyclic group; and m represents 0 or 1.
摘要翻译： 抗蚀剂组合物包括（A）树脂，其包含：能够通过酸的分解而分解的碱性显影液中的溶解度并由式（I）表示的重复单元和由式（II）表示的重复单元的重复单元; 和（B）能够在用光化射线或辐射照射时能够产生酸的化合物：其中A表示氢原子，烷基，羟基，烷氧基，卤素原子，氰基，硝基， 酰基，酰氧基，环烷基，芳基，羧基，烷氧基羰基，烷基羰基氧基或芳烷基; Ra表示含有能够通过酸的作用分解的基团的基团; Rb表示亚烷基，亚环烷基或组合这些基团的基团; Y表示杂环基; m表示0或1。
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公开(公告)号：US20100248146A1
公开(公告)日：2010-09-30
申请号：US12672329
申请日：2008-08-01
CPC分类号： G03F7/0397 , C08F8/12 , C08F12/22 , C08F12/24 , C08F212/14 , C08F2800/10 , G03F7/0045 , G03F7/0392 , Y10S430/114 , Y10S430/146 , C08F220/18 , C08F2220/1825 , C08F220/14
摘要： A positive resist composition comprising (A) a resin which contains all of the repeating units represented by formulae (I) to (III), and becomes soluble in an alkali developer by the action of an acid, and (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation; and a pattern forming method using the composition. A represents a group capable of decomposing and leaving by the action of an acid, each R1 independently represents hydrogen or a methyl group, R2 represents a phenyl group or a cyclohexyl group, m represents 1 or 2, and n represents an integer of 0 to 2. By virtue of this construction, a resist composition ensuring high resolution, good pattern profile, sufficient depth of focus, little defects after development, and sufficiently high plasma etching resistance is provided.
摘要翻译： 一种正型抗蚀剂组合物，其包含（A）含有由式（I）至（III）表示的所有重复单元的树脂，并且通过酸的作用变得可溶于碱性显影剂，和（B）能够 在用光化射线或辐射照射时产生酸; 以及使用该组合物的图案形成方法。 A表示能够通过酸的分解和离去的基团，每个R 1独立地表示氢或甲基，R 2表示苯基或环己基，m表示1或2，n表示0〜 通过这种结构，提供了确保高分辨率，良好的图案轮廓，足够的焦深，显影后的小缺陷以及足够高的耐等离子体耐蚀刻性的抗蚀剂组合物。
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4.发明授权公开(公告)号：US07923196B2
公开(公告)日：2011-04-12
申请号：US12672329
申请日：2008-08-01
CPC分类号： G03F7/0397 , C08F8/12 , C08F12/22 , C08F12/24 , C08F212/14 , C08F2800/10 , G03F7/0045 , G03F7/0392 , Y10S430/114 , Y10S430/146 , C08F220/18 , C08F2220/1825 , C08F220/14
摘要： A positive resist composition comprising (A) a resin which contains all of the repeating units represented by formulae (I) to (III), and becomes soluble in an alkali developer by the action of an acid, and (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation; and a pattern forming method using the composition. A represents a group capable of decomposing and leaving by the action of an acid, each R1 independently represents hydrogen or a methyl group, R2 represents a phenyl group or a cyclohexyl group, m represents 1 or 2, and n represents an integer of 0 to 2. By virtue of this construction, a resist composition ensuring high resolution, good pattern profile, sufficient depth of focus, little defects after development, and sufficiently high plasma etching resistance is provided.
摘要翻译： 一种正型抗蚀剂组合物，其包含（A）含有由式（I）至（III）表示的所有重复单元的树脂，并且通过酸的作用变得可溶于碱性显影剂，和（B）能够 在用光化射线或辐射照射时产生酸; 以及使用该组合物的图案形成方法。 A表示能够通过酸的分解和离去的基团，每个R 1独立地表示氢或甲基，R 2表示苯基或环己基，m表示1或2，n表示0〜 通过这种结构，提供了确保高分辨率，良好的图案轮廓，足够的焦深，显影后的小缺陷以及足够高的耐等离子体耐蚀刻性的抗蚀剂组合物。
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5.发明申请公开(公告)号：US20110081612A1
公开(公告)日：2011-04-07
申请号：US12895504
申请日：2010-09-30
申请人： Kana FUJII , Takamitsu Tomiga , Toru Tsuchihashi , Kazuyoshi Mizutani , Jiro Yokoyama , Shinichi Sugiyama , Shuji Hirano , Toru Fujimori
发明人： Kana FUJII , Takamitsu Tomiga , Toru Tsuchihashi , Kazuyoshi Mizutani , Jiro Yokoyama , Shinichi Sugiyama , Shuji Hirano , Toru Fujimori
CPC分类号： G03F7/0392 , C08F8/12 , C08F12/22 , C08F214/18 , C08F220/18 , C08F220/22 , C08F220/32 , C08F2220/282 , C08K5/375 , C08K5/42 , C08L33/068 , C08L51/04 , C08L67/02 , C09D125/14 , C09D125/18 , G03F7/0045 , G03F7/0046 , C08F212/14 , C08F2220/1825 , C08F2220/185 , C08F220/14
摘要： According to one embodiment, an actinic ray-sensitive or radiation-sensitive resin composition includes (A) a resin containing the repeating units of formulae (I), (II) and (III) that when acted on by an acid, becomes soluble in an alkali developer, and (B) a compound that when irradiated with actinic rays or radiation, generates a fluorine-containing acid, wherein each of R1 independently represents a hydrogen atom or an optionally substituted methyl group, R2 represents a halogen atom, an optionally substituted alkyl group, an optionally substituted cycloalkyl group, an optionally substituted aryl group or an optionally substituted aralkyl group, and n is an integer of 0 to 5, provided that when n is 2 or greater, multiple R2s may be identical to or different from each other.
摘要翻译： 根据一个实施方案，光化射线敏感或辐射敏感性树脂组合物包含（A）含有式（I），（II）和（III）的重复单元的树脂，当被酸作用时，其变得易溶于 碱显影剂和（B）当用光化射线或辐射照射时产生含氟酸的化合物，其中R 1各自独立地表示氢原子或任选取代的甲基，R 2表示卤素原子，任选地 取代的烷基，任选取代的环烷基，任选取代的芳基或任选取代的芳烷基，n为0至5的整数，条件是当n为2或更大时，多个R 2可以相同或不同 彼此。
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6.发明授权公开(公告)号：US07592118B2
公开(公告)日：2009-09-22
申请号：US12053675
申请日：2008-03-24
CPC分类号： G03F7/0392 , G03F7/091 , Y10S430/106 , Y10S430/111
摘要： A positive resist composition, includes: (B) a resin containing a repeating unit represented by formula (Ia) or (Ib) as defined in the specification, which decomposes under an action of an acid to increase a solubility of the resin (B) in an aqueous alkali solution; and (A) a compound capable of generating an acid upon irradiation with actinic rays or radiation, and a pattern forming method uses the composition.
摘要翻译： 正型抗蚀剂组合物包括：（B）含有本说明书中定义的由式（Ia）或（Ib）表示的重复单元的树脂，其在酸的作用下分解以增加树脂（B）的溶解度， 在碱性水溶液中; 和（A）能够在用光化射线或辐射照射时能够产生酸的化合物，并且图案形成方法使用该组合物。
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公开(公告)号：US20080241743A1
公开(公告)日：2008-10-02
申请号：US12053675
申请日：2008-03-24
CPC分类号： G03F7/0392 , G03F7/091 , Y10S430/106 , Y10S430/111
摘要： A positive resist composition, includes: (B) a resin containing a repeating unit represented by formula (Ia) or (Ib) as defined in the specification, which decomposes under an action of an acid to increase a solubility of the resin (B) in an aqueous alkali solution; and (A) a compound capable of generating an acid upon irradiation with actinic rays or radiation, and a pattern forming method uses the composition.
摘要翻译： 正型抗蚀剂组合物包括：（B）含有本说明书中定义的由式（Ia）或（Ib）表示的重复单元的树脂，其在酸的作用下分解以增加树脂（B）的溶解度， 在碱性水溶液中; 和（A）能够在用光化射线或辐射照射时能够产生酸的化合物，并且图案形成方法使用该组合物。
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8.发明授权公开(公告)号：US08142977B2
公开(公告)日：2012-03-27
申请号：US12057441
申请日：2008-03-28
CPC分类号： G03F7/0392 , G03F7/0397
摘要： A positive resist composition, includes: (B1) a resin capable of decomposing under an action of an acid to increase a solubility of the resin (B1) in an aqueous alkali solution, the resin (B1) containing a specific hydroxystyrene-based repeating unit and/or (meth)acrylic acid-based repeating unit as defined in the specification; (B2) a resin capable of decomposing under an action of an acid to increase a solubility of the resin (B2) in an aqueous alkali solution, the resin (B2) containing a specific hydroxystyrene-based repeating unit and/or (meth)acrylic acid-based repeating unit as defined in the specification and containing a specific aromatic ring structure-containing repeating unit as defined in the specification; and (A) a compound capable of generating an acid upon irradiation with actinic rays or radiation, and a pattern forming method uses the composition.
摘要翻译： 正型抗蚀剂组合物包括：（B1）能够在酸的作用下分解以提高树脂（B1）在碱性水溶液中的溶解度的树脂，所述树脂（B1）含有特定的羟基苯乙烯类重复单元 和/或（甲基）丙烯酸类重复单元; （B2）能够在酸的作用下分解以增加树脂（B2）在碱性水溶液中的溶解度的树脂，所述树脂（B2）含有特定的羟基苯乙烯类重复单元和/或（甲基）丙烯酸酯 酸基重复单元，其含有本说明书中定义的特定芳环结构的重复单元; 和（A）能够在用光化射线或辐射照射时能够产生酸的化合物，并且图案形成方法使用该组合物。
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公开(公告)号：US20070224539A1
公开(公告)日：2007-09-27
申请号：US11727002
申请日：2007-03-23
IPC分类号： G03C1/00
CPC分类号： G03F7/0392 , G03F7/0045 , G03F7/0382
摘要： A resist composition comprising at least one kind of a nitrogen-containing compound selected from the group consisting of an amine compound having a phenoxy group, an ammonium salt compound having a phenoxy group, an amine compound having a sulfonic acid ester group and an ammonium salt compound having a sulfonic acid ester group; and a pattern forming method using the composition.
摘要翻译： 一种抗蚀剂组合物，其包含至少一种选自具有苯氧基的胺化合物，具有苯氧基的铵盐化合物，具有磺酸酯基的胺化合物和铵盐的含氮化合物 具有磺酸酯基的化合物; 以及使用该组合物的图案形成方法。
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公开(公告)号：US08785104B2
公开(公告)日：2014-07-22
申请号：US12921354
申请日：2009-03-13
CPC分类号： G03F7/0045 , C08F8/12 , C08F12/24 , C09D125/14 , G03F7/0046 , G03F7/0392 , G03F7/0397 , C08F212/14 , C08F2220/1825
摘要： A resist composition and a pattern forming method using the composition are provided, the resist composition including: (A) a resin that decomposes by an action of an acid to increase a solubility of the resin (A) in an alkali developer; (B) a compound capable of generating an acid upon irradiation with actinic rays or radiation; (C) a compound represented by formula (C1); and (D) a solvent: wherein n represents an integer of 1 to 6; w represents an integer of 1 to 6; p represents an integer of 1 to 6; m represents an integer of 1 to 6; Ra, Rb, Rc and Rd each independently represents a hydrogen atom, an alkyl group, a cycloalkyl group, an aryl group or an aralkyl group, provided that Ra and Rb may combine together to form a ring, and Rc and Rd may combine together to form a ring.
摘要翻译： 提供了使用该组合物的抗蚀剂组合物和图案形成方法，该抗蚀剂组合物包括：（A）通过酸的作用分解以提高树脂（A）在碱性显影剂中的溶解度的树脂; （B）能够在用光化射线或辐射照射时能够产生酸的化合物; （C）由式（C1）表示的化合物; 和（D）溶剂：其中n表示1至6的整数; w表示1〜6的整数， p表示1〜6的整数， m表示1〜6的整数， Ra，Rb，Rc和Rd各自独立地表示氢原子，烷基，环烷基，芳基或芳烷基，条件是Ra和Rb可以结合在一起形成环，Rc和Rd可以结合在一起 形成一个戒指。
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