Invention Application
US20080246931A1 Substrate processing method, exposure apparatus, and method for producing device
审中-公开
基板加工方法，曝光装置及其制造方法
- Patent Title: Substrate processing method, exposure apparatus, and method for producing device
- Patent Title (中): 基板加工方法，曝光装置及其制造方法
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Application No.: US12155714Application Date: 2008-06-09
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Publication No.: US20080246931A1Publication Date: 2008-10-09
- Inventor: Katsushi Nakano , Masahiko Okumura , Tarou Sugihara , Takeyuki Mizutani , Tomoharu Fujiwara
- Applicant: Katsushi Nakano , Masahiko Okumura , Tarou Sugihara , Takeyuki Mizutani , Tomoharu Fujiwara
- Applicant Address: JP TOKYO
- Assignee: NIKON CORPORATION
- Current Assignee: NIKON CORPORATION
- Current Assignee Address: JP TOKYO
- Priority: JP2004-310993 20041026
- Main IPC: G03B27/52
- IPC: G03B27/52
Abstract:
An immersion type lithographic apparatus includes at least one immersion space and an immersion system configured to at least partially fill the immersion space with a liquid. The apparatus is configured to rinse at least part of the immersion space with a rinsing liquid before the apparatus is used to project a patterned beam of radiation onto a substrate.
Public/Granted literature
- US08941808B2 Immersion lithographic apparatus rinsing outer contour of substrate with immersion space Public/Granted day:2015-01-27
Information query
