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31 条记录 (耗时 0.024 秒)

    Exposure apparatus and stage device, and device manufacturing method
    1.
    发明申请
    Exposure apparatus and stage device, and device manufacturing method 失效
    曝光装置及舞台装置及装置的制造方法

    公开(公告)号：US20050024610A1

    公开(公告)日：2005-02-03

    申请号：US10456485

    申请日：2003-06-09

    申请人： Kenji Nishi ,  Masahiko Okumura ,  Hiroki Okuno

    发明人： Kenji Nishi ,  Masahiko Okumura ,  Hiroki Okuno

    IPC分类号： G03F7/20 ,  H01L21/027 ,  G03B27/42

    CPC分类号： G03F7/70425 ,  G03F7/70725 ,  G03F7/70733

    摘要： After exposure of a divided area on a wafer is completed, for exposure of the next divided area, a control unit sends configuration information on control parameters necessary to expose the next divided area to a stage control system, sometime before the stage control system begins deceleration of a reticle stage and a wafer stage in a scanning direction. Therefore, both stages do not have to be suspended before acceleration for the stage control system to receive the configuration information on control parameters necessary to expose the next divided area, and since suspension time is not required, throughput can be improved. In this case, no serious problems occur, so the performance of other devices is not disturbed.

    摘要翻译： 在晶片上的分割区域的曝光完成之后，为了下一个分割区域的曝光，控制单元将阶段控制系统开始减速之前的某个时刻向控制系统发送关于将下一个分割区域暴露出来的控制参数的配置信息 的标线片台和扫描方向的晶片台。 因此，在阶段控制系统的加速之前，不需要暂停两个阶段，以接收关于暴露下一个分割区域所需的控制参数的配置信息，并且由于不需要暂停时间，因此可以提高生产率。 在这种情况下，不会出现严重的问题，所以其他设备的性能不会受到干扰。

    Tilting apparatus
    2.
    发明授权
    Tilting apparatus 失效
    倾斜装置

    公开(公告)号：US5473424A

    公开(公告)日：1995-12-05

    申请号：US363336

    申请日：1994-12-23

    申请人： Masahiko Okumura

    发明人： Masahiko Okumura

    IPC分类号： H01L21/68 ,  G03F7/20 ,  G03F9/00 ,  H01L21/027 ,  G03B27/42

    CPC分类号： G03F7/707 ,  G03F9/70

    摘要： A table holding a substrate thereon is placed on a focusing and levelling stage through three fulcrums, and a calculator receives as inputs the coordinates values of the table measured by an interferometer, the amount of positional deviation between the surface of a wafer and a predetermined fiducial plane at each of a plurality of measuring points on the substrate which is measured by a multipoint AF sensor, and a weight coefficient given to be to the amount of positional deviation at each of the plurality of measuring points, thereby calculating the residual deviation at each of the three fulcrums. A controller adopts the PID control system and controls the amounts of displacement of the three fulcrums on the basis of the residual deviation calculated by the calculator, the integrated value of this residual deviation and the differentiated value of this residual deviation.

    摘要翻译： 保持基板的台面通过三个支点放置在聚焦和调平台上，并且计算器接收由干涉仪测量的表的坐标值作为输入，晶片表面与预定基准之间的位置偏差量 在由多点AF传感器测量的基板上的多个测量点中的每一个测量点处的平面和给定为多个测量点中的每个测量点处的位置偏差量的加权系数，从而计算每个测量点处的各个位置偏差 的三个支点。 控制器采用PID控制系统，根据计算器计算的剩余偏差，该残差的积分值和该残差的微分值，控制三个支点的位移量。

    Pipe fitting
    3.
    发明授权
    Pipe fitting 失效
    管道配件

    公开(公告)号：US5431456A

    公开(公告)日：1995-07-11

    申请号：US266342

    申请日：1994-07-01

    申请人： Masahiko Okumura ,  Noriyuki Moritani ,  Kazuki Nakamichi

    发明人： Masahiko Okumura ,  Noriyuki Moritani ,  Kazuki Nakamichi

    IPC分类号： B29C45/14 ,  B29D99/00 ,  B32B27/00 ,  F16L41/02 ,  F16L47/04 ,  F16L47/26 ,  F16L41/00

    CPC分类号： F16L47/26 ,  F16L47/04 ,  Y10S285/906

    摘要： A pipe fitting or coupling is used for connecting at least two pipes. The pipe fitting is basically formed of a coupling main body and a slit ring integrally formed together. The coupling main body is formed of an inner layer of good heat resisting property, an intermediate layer containing glass fibers, and an outer layer having large tensile elongation and impact strength. The slit ring is formed at an edge portion of the outer circumferential surface of the coupling main body.

    摘要翻译： 管件或联轴器用于连接至少两根管道。 管件基本上由联接主体和整体形成在一起的狭缝环形成。 联轴器主体由耐热性良好的内层，含有玻璃纤维的中间层和具有大的拉伸伸长率和冲击强度的外层构成。 狭缝环形成在联接器主体的外周面的边缘部。

    HOLDING DEVICE AND EXPOSURE APPARATUS
    5.
    发明申请
    HOLDING DEVICE AND EXPOSURE APPARATUS 审中-公开
    保持装置和曝光装置

    公开(公告)号：US20090097009A1

    公开(公告)日：2009-04-16

    申请号：US12275764

    申请日：2008-11-21

    申请人： Masahiko OKUMURA

    发明人： Masahiko OKUMURA

    IPC分类号： G03B27/64

    CPC分类号： G03F7/70783 ,  G03F7/707

    摘要： A reticle is supported by flexible reticle holders at its +X and −X end portions, and therefore even if there is unevenness on the supported portions of the reticle, the surfaces of the reticle holders are transformed following the unevenness, which makes it possible to restrain deformation of the reticle as much as possible. Further, with support pins that contact with the reticle holders at three points that are not in a same straight line, the positions of the reticle holders in a height direction (Z-axis direction) at the contacting portions are set, and in addition, with a self-weight cancelling mechanism that includes piston members that contact with the reticle holders at three points that are not in a same straight line, bending due to self weights of the reticle and the reticle holders is restrained.

    摘要翻译： 掩模版在其+ X和-X端部由柔性掩模保持器支撑，因此即使在掩模版的被支撑部分上存在凹凸，根据不平坦度，变形了标线架保持器的表面，这使得可以 尽可能地限制标线的变形。 此外，通过在不同于直线的三个点处与标线架保持件接触的支撑销设置接合部处的高度方向（Z轴方向）上的标线架保持件的位置，另外， 具有自重减轻机构，其包括在不同于直线的三个点处与标线架保持器接触的活塞构件，由于掩模版和标线保持器的自重而受到弯曲。

    Stage apparatus and exposure apparatus
    10.
    发明申请
    Stage apparatus and exposure apparatus 审中-公开
    舞台装置和曝光装置

    公开(公告)号：US20070188732A1

    公开(公告)日：2007-08-16

    申请号：US11659280

    申请日：2005-08-02

    申请人： Yuichi Shibazaki ,  Masahiko Okumura ,  Yasuhiro Hidaka

    发明人： Yuichi Shibazaki ,  Masahiko Okumura ,  Yasuhiro Hidaka

    IPC分类号： G03B27/58

    CPC分类号： G03F7/70775

    摘要： The position of a movable stage is detected without increasing cost or the size of apparatus. An apparatus comprises movable stages (WST, MST) that move along a plane of motion (12a); and a position-detection apparatus that detects the positions of the movable stages (WST, MST) with beams (B1 to B3). The apparatus further comprises driving apparatuses (82, 84) that drives the movable stages (WST, MST); follow-up optical members (30 to 33) which are provided on the driving apparatuses (81, 84) and cause the beams (B1 to B3) to follow the movable stages (WST, MST) as the movable stages (WST, MST) move; and first optical members (34 to 39) which are provided on the movable stages (WST, MST) and are optically coupled with the follow-up optical members (30 to 33).

    摘要翻译： 检测可移动台的位置，而不增加装置的成本或尺寸。 一种装置包括沿着运动平面（12a）移动的可动台（WST，MST）; 以及利用光束（B 1〜B 3）检测可动台（WST，MST）的位置的位置检测装置。 该装置还包括驱动可移动级（WST，MST）的驱动装置（82,84）。 设置在驱动装置（81,84）上的随动光学构件（30〜33），并使梁（B 1〜B 3）作为可动台（WST， MST）移动; 和第一光学构件（34至39），其设置在可移动台（WST，MST）上并且与后续光学构件（30至33）光学耦合。