发明申请
- 专利标题： Self-aligned full side shield PMR and method to make it
- 专利标题（中）： 自对准全侧盾PMR及其制作方法
-
申请号： US11728910申请日： 2007-03-27
-
公开(公告)号： US20080253035A1公开(公告)日： 2008-10-16
- 发明人: Cherng-Chyi Han , Min Li , Fenglin Liu , Chen-Jung Chien
- 申请人： Cherng-Chyi Han , Min Li , Fenglin Liu , Chen-Jung Chien
- 专利权人： Headway Technologies, Inc.
- 当前专利权人： Headway Technologies, Inc.
- 主分类号： G11B5/33
- IPC分类号： G11B5/33 ; B44C1/22
摘要：
A process for forming the write pole of a PMR head is described. This write pole is symmetrically located relative to its side shields, This is accomplished, not through optical alignment, but by coating the pole with a uniform layer of non-magnetic material of a predetermined and precise thickness, followed by the formation of the shield layer around this.
公开/授权文献
信息查询
IPC分类:
