Invention Application
- Patent Title: Semiconductor Device, Method for Manufacturing Semiconductor Devices and Mask Systems Used in the Manufacturing of Semiconductor Devices
- Patent Title (中): 半导体器件，用于制造半导体器件的半导体器件和掩模系统的制造方法
-
Application No.: US11738086Application Date: 2007-04-20
-
Publication No.: US20080261395A1Publication Date: 2008-10-23
- Inventor: Stefan Blawid , Ludovic Lattard , Roman Knoefler , Manuela Gutsch , David Pritchard , Martin Roessiger
- Applicant: Stefan Blawid , Ludovic Lattard , Roman Knoefler , Manuela Gutsch , David Pritchard , Martin Roessiger
- Main IPC: H01L23/48
- IPC: H01L23/48 ; G03F1/00 ; H01L21/44
Abstract:
Semiconductor device with a first structure comprising a plurality of at least in part parallel linear structures, a second structure comprising a plurality of pad structures, forming at least in part one of the group of linear structure, curved structure, piecewise linear structure and piecewise curved structure which is positioned at an angle to the first structure, and the plurality of pad structures are intersecting at least one of the linear structures in the first structure. An electronic device with at least one semiconductor device, methods for manufacturing a semiconductor device and a mask system are also covered.
Public/Granted literature
Information query
IPC分类:
