发明申请
US20080263502A1 MASK PATTERN DATA GENERATING METHOD, INFORMATION PROCESSING APPARATUS, PHOTOMASK FABRICATION SYSTEM, AND IMAGE SENSING APPARATUS
有权
掩模图形数据生成方法，信息处理装置，光电装置制造系统和图像感测装置
- 专利标题： MASK PATTERN DATA GENERATING METHOD, INFORMATION PROCESSING APPARATUS, PHOTOMASK FABRICATION SYSTEM, AND IMAGE SENSING APPARATUS
- 专利标题（中）： 掩模图形数据生成方法，信息处理装置，光电装置制造系统和图像感测装置
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申请号： US12048691申请日： 2008-03-14
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公开(公告)号： US20080263502A1公开(公告)日： 2008-10-23
- 发明人: Kyouhei Watanabe , Masaki Kurihara , Hitoshi Shindo , Nobuhiko Sato , Yasuhiro Sekine , Masataka Ito
- 申请人： Kyouhei Watanabe , Masaki Kurihara , Hitoshi Shindo , Nobuhiko Sato , Yasuhiro Sekine , Masataka Ito
- 申请人地址： JP Tokyo
- 专利权人： CANON KABUSHIKI KAISHA
- 当前专利权人： CANON KABUSHIKI KAISHA
- 当前专利权人地址： JP Tokyo
- 优先权： JP2007-108664 20070417; JP2007-335063 20071226
- 主分类号： G06F17/50
- IPC分类号： G06F17/50
摘要：
A method for generating mask pattern data of a photomask used to form microlenses divides a pattern formation surface of a mask pattern to be used for the photomask into a plurality of grid cells, acquires data which represents transmitted light distribution of the mask pattern to be used for the photomask, determines whether to place a shield on each of the plurality of grid cells by binarizing the plurality of grid cells in order of increasing or decreasing distance from a center of the pattern formation surface using an error diffusion method to acquire the transmitted light distribution, and generates mask pattern data which represents an arrangement of the shields based on results from the determining step.