公开(公告)号：US08817144B2

公开(公告)日：2014-08-26

申请号：US13365146

申请日：2012-02-02

申请人： Taro Kato ,  Mineo Shimotsusa ,  Hiroaki Sano ,  Takeshi Ichikawa ,  Yasuhiro Sekine ,  Mahito Shinohara ,  Genzo Momma

发明人： Taro Kato ,  Mineo Shimotsusa ,  Hiroaki Sano ,  Takeshi Ichikawa ,  Yasuhiro Sekine ,  Mahito Shinohara ,  Genzo Momma

IPC分类号： H01L21/00

CPC分类号： H01L27/14627 ,  H01L27/14621 ,  H01L27/14629 ,  H01L27/1463

摘要： A photoelectric conversion apparatus includes a semiconductor substrate having a photoelectric conversion portion. An insulator is provided on the semiconductor substrate. The insulator has a hole corresponding to the photoelectric conversion portion. A waveguide member is provided in the hole. An in-layer lens is provided on a side of the waveguide member farther from the semiconductor substrate. A first intermediate member is provided between the waveguide member and the in-layer lens. The first intermediate member has a lower refractive index than the in-layer lens.

摘要翻译： 光电转换装置包括具有光电转换部分的半导体衬底。 绝缘体设置在半导体衬底上。 绝缘体具有与光电转换部对应的孔。 波导构件设置在孔中。 在距离半导体衬底更远的波导构件的一侧设置有层内透镜。 第一中间构件设置在波导构件和内层透镜之间。 第一中间构件具有比层内透镜低的折射率。

公开(公告)号：US08105765B2

公开(公告)日：2012-01-31

申请号：US12709571

申请日：2010-02-22

申请人： Yasuhiro Sekine

发明人： Yasuhiro Sekine

IPC分类号： G03C5/00 ,  G03F1/00

CPC分类号： G03F7/70475 ,  G03F1/00

摘要： A method of manufacturing a semiconductor device by performing divisional exposure on a predetermined area on a wafer, through two or more reticles, on each of which a mask pattern region is formed. The method includes arranging the reticles such that an outer most periphery of a field circle of exposure light incident on the wafer aligns with at least one side of the mask pattern region formed in the reticle, and exposing, to exposure light, the wafer, through the reticles so arranged.

摘要翻译： 通过在其上形成有掩模图案区域的两个或更多个掩模版上对晶片上的预定区域进行分割曝光来制造半导体器件的方法。 所述方法包括：布置所述掩模版，使得入射到所述晶片上的曝光光场的外圆的最外边缘与形成在所述标线板中的所述掩模图案区域的至少一侧对准，并将所述晶片曝光于曝光 这样安排了掩模版。

公开(公告)号：US20110242388A1

公开(公告)日：2011-10-06

申请号：US13139558

申请日：2010-01-20

申请人： Takanori Watanabe ,  Mineo Shimotsusa ,  Takeshi Ichikawa ,  Hajime Ikeda ,  Yasuhiro Sekine ,  Akira Ohtani ,  Takeshi Kojima

发明人： Takanori Watanabe ,  Mineo Shimotsusa ,  Takeshi Ichikawa ,  Hajime Ikeda ,  Yasuhiro Sekine ,  Akira Ohtani ,  Takeshi Kojima

IPC分类号： H04N5/335 ,  H01L27/146

CPC分类号： H01L27/1463 ,  H01L27/14609 ,  H01L27/1464 ,  H01L27/14641 ,  H01L27/14689 ,  H01L29/7833

摘要： An image sensing device comprises a pixel array, and a peripheral circuit, a column selecting circuit, and a readout, wherein each pixel includes a photodiode, a floating diffusion, a transfer PMOS transistor to the floating diffusion, an amplifier PMOS transistor, and a reset PMOS transistor, the amplifier PMOS transistor has a gate which is formed by an n-type conductive pattern, and is isolated by a first element isolation region and an n-type impurity region which covers at least a lower portion of the first element isolation region, and each PMOS transistor included in the column selecting circuit has a gate which is formed by a p-type conductive pattern and is isolated by a second element isolation region, and an n-type impurity concentration in a region adjacent to a lower portion of the second element isolation region is lower than that in the n-type impurity region.

摘要翻译： 图像感测装置包括像素阵列，外围电路，列选择电路和读出器，其中每个像素包括光电二极管，浮动扩散，到浮动扩散的转移PMOS晶体管，放大器PMOS晶体管和 复位PMOS晶体管，放大器PMOS晶体管具有由n型导电图案形成的栅极，并且被第一元件隔离区域和覆盖至少第一元件隔离的下部的n型杂质区隔离 区域，并且列选择电路中包括的每个PMOS晶体管具有由p型导电图案形成并由第二元件隔离区域隔离的栅极，并且与下部分相邻的区域中的n型杂质浓度 的第二元件隔离区域低于n型杂质区域。

公开(公告)号：US07749691B2

公开(公告)日：2010-07-06

申请号：US11212649

申请日：2005-08-29

申请人： Yasuhiro Sekine

发明人： Yasuhiro Sekine

IPC分类号： G03C5/00

CPC分类号： G03F7/70475 ,  G03F1/00

摘要： A method of manufacturing a photoelectric conversion device. The method includes the steps of arranging a plurality of reticles, on each of which a mask pattern region is formed, in an arrangement direction and using at least two of the plurality of reticles in the method, such that, in at least one of the reticles being used, (i) a center of the at least one reticle, which is aligned with an optical axis of light for exposure, is shifted from (ii) a center of the mask pattern region formed on the at least one reticle, in a direction parallel to the arrangement direction of the plurality of reticles, and performing the exposure of a predetermined region on a wafer using the at least two of the plurality of reticles, in order to manufacture the photoelectric conversion device.

摘要翻译： 一种制造光电转换装置的方法。 该方法包括以下步骤：在所述方法中，在布置方向上布置多个掩模版，每个在其上形成有掩模图案区域，并且在所述方法中使用所述多个掩模版中的至少两个，使得在至少一个 使用标线片，（i）与用于曝光的光的光轴对准的至少一个掩模版的中心从（ii）形成在至少一个掩模版上的掩模图案区域的中心偏移， 与所述多个标线板的排列方向平行的方向，并使用所述多个光栅中的所述至少两个，进行所述晶片上的预定区域的曝光，以制造所述光电转换装置。

公开(公告)号：US07202103B2

公开(公告)日：2007-04-10

申请号：US11280323

申请日：2005-11-17

申请人： Yasuhiro Sekine ,  Shigeki Mori

发明人： Yasuhiro Sekine ,  Shigeki Mori

IPC分类号： H01L21/00 ,  G03F7/00

CPC分类号： H01L31/02162 ,  H01L27/14621 ,  H01L27/14623 ,  H01L27/14627 ,  H01L27/14685

摘要： A solid state image pickup element which can exponentially reduce the in-plane photoelectric conversion portion characteristic distribution created in forming color filters by a common photolithography technique and which, when color filters are formed by split exposure, can reduce image non-uniformity between exposure regions in a picked-up image, and a method of manufacturing the same. The method includes: applying negative type color resist for forming first color filters onto an entire surface of a given film; forming the first color filters by irradiation of given portions with exposure light and subsequent development; applying negative type color resist for forming second color filters onto the entire surface of the first color filters while covering the first color filters; and forming the second color filters by irradiating an area smaller than a region that is surrounded by the first color filters with exposure light and subsequent development.

摘要翻译： 一种固态摄像元件，其可以通过通常的光刻技术指数​​地降低在形成滤色器时产生的面内光电转换部分特性分布，并且当通过分割曝光形成滤色器时，可以降低曝光区域之间的图像不均匀性 在拾取图像中，以及其制造方法。 该方法包括：在给定膜的整个表面上施加用于形成第一滤色器的负型彩色抗蚀剂; 通过用曝光光照射给定部分并随后显影来形成第一滤色器; 在覆盖第一滤色器的同时，在第一滤色片的整个表面上施加用于形成第二滤色器的负型彩色抗蚀剂; 以及通过用曝光光照射小于由第一滤色器包围的区域的区域并随后显影来形成第二滤色器。

公开(公告)号：US20060076591A1

公开(公告)日：2006-04-13

申请号：US11280323

申请日：2005-11-17

申请人： Yasuhiro Sekine ,  Shigeki Mori

发明人： Yasuhiro Sekine ,  Shigeki Mori

IPC分类号： H01L31/062 ,  H01L21/00

CPC分类号： H01L31/02162 ,  H01L27/14621 ,  H01L27/14623 ,  H01L27/14627 ,  H01L27/14685

摘要： Provided is a solid state image pickup element which can exponentially reduce the in-plane photoelectric conversion portion characteristic distribution that is created in forming color filters by a common photolithography technique and which, when color filters are formed by split exposure, can reduce image non-uniformity between exposure regions in a picked-up image, and a method of manufacturing the same. The method includes: applying negative type color resist for forming first color filters onto an entire surface of a given film; forming the first color filters by irradiation of given portions with exposure light and by subsequent development; applying negative type color resist for forming second color filters onto the entire surface of the first color filters while covering the first color filters; and forming the second color filters by irradiating an area smaller than a region that is surrounded by the first color filters with exposure light and by subsequent development. Further, in the solid state image pickup element with color filters of plural colors, one of adjacent color filters is tapered at the edges while the other color filter is reversely tapered at the edges, allowing the adjacent color filters to fit to each other. Furthermore, adjacent color filters are wedged at the edges, allowing the adjacent color filters to fit to each other.

摘要翻译： 提供了一种固态摄像元件，其能够通过通常的光刻技术指数​​地降低在形成滤色器时产生的面内光电转换部分特性分布，并且当通过分割曝光形成滤色器时， 拾取图像中的曝光区域之间的均匀性及其制造方法。 该方法包括：在给定膜的整个表面上施加用于形成第一滤色器的负型彩色抗蚀剂; 通过用曝光光照射给定部分并随后显影来形成第一滤色器; 在覆盖第一滤色器的同时，在第一滤色片的整个表面上施加用于形成第二滤色器的负型彩色抗蚀剂; 以及通过用曝光灯照射小于由第一滤色器包围的区域的区域并随后显影来形成第二滤色器。 此外，在具有多种颜色的滤色片的固态图像拾取元件中，相邻滤色器之一在边缘处是渐缩的，而另一个滤色器在边缘处是倒锥形的，允许相邻的滤色器彼此配合。 此外，相邻的滤色器楔入边缘，允许相邻的滤色器彼此配合。

公开(公告)号：US06586811B2

公开(公告)日：2003-07-01

申请号：US09825839

申请日：2001-04-05

申请人： Yasuhiro Sekine

发明人： Yasuhiro Sekine

IPC分类号： H01L310232

CPC分类号： H01L27/14685 ,  H01L27/14621 ,  H01L27/14627

摘要： A microlens of which surface is a conductive surface, or a solid state imaging device equipped with the microlens, in which the conductive surface can be given by a metal oxide film, a film containing carbon as a main component, a surface-modified film or the like.

摘要翻译： 其表面是导电表面的微透镜，或配备有微透镜的固态成像装置，其中导电表面可以由金属氧化物膜，含碳作为主要成分的膜，表面改性膜或 类似。

公开(公告)号：US06476887B1

公开(公告)日：2002-11-05

申请号：US09929036

申请日：2001-08-15

申请人： Yasuhiro Sekine ,  Shunsuke Inoue ,  Hiroshi Mizuno

发明人： Yasuhiro Sekine ,  Shunsuke Inoue ,  Hiroshi Mizuno

IPC分类号： G02F11333

CPC分类号： G02F1/1334 ,  G02F2001/13345

摘要： This invention provides a liquid crystal display which comprises a first region including a display region, and a second region being outside the first region, wherein the first and second regions both contain liquid crystal in a polymer network, and a part of the polymer network of the second region is different in structure from the polymer network of the first region, and the part is present in the second region asymmetrically with respect to the first region, and a production method for a liquid crystal display, which comprises providing a liquid crystal material and a prepolymer material in a space between a pair of substrates at least one of which is transparent, and polymerizing the prepolymer material by scanning a first region including a display region and a second region outside the first region with a light beam which causes polymerization.

摘要翻译： 本发明提供了一种液晶显示器，其包括包括显示区域的第一区域和位于第一区域外部的第二区域，其中第一和第二区域均包含聚合物网络中的液晶，以及聚合物网络的一部分 所述第二区域的结构与所述第一区域的聚合物网络不同，并且所述部分相对于所述第一区域不对称地存在于所述第二区域中，以及液晶显示器的制造方法，其包括提供液晶材料 以及预聚物材料，在一对基板之间的空间中，其中至少一个是透明的，并且通过用引起聚合的光束扫描包括显示区域和第一区域外的第二区域的第一区域来聚合预聚物材料。

公开(公告)号：US5376231A

公开(公告)日：1994-12-27

申请号：US871188

申请日：1992-04-20

申请人： Shigeyuki Matsumoto ,  Yasuhiro Naruse ,  Genzo Monma ,  Kei Fujita ,  Seiji Kamei ,  Yutaka Akino ,  Yasuhiro Sekine ,  Yukihiro Hayakawa

发明人： Shigeyuki Matsumoto ,  Yasuhiro Naruse ,  Genzo Monma ,  Kei Fujita ,  Seiji Kamei ,  Yutaka Akino ,  Yasuhiro Sekine ,  Yukihiro Hayakawa

IPC分类号： B41J2/14 ,  B41J2/16 ,  H01L21/321 ,  H01L21/3213 ,  H01L21/306 ,  B44C1/22 ,  C23F1/00

CPC分类号： B41J2/1629 ,  B41J2/14129 ,  B41J2/1604 ,  B41J2/1628 ,  B41J2/1631 ,  B41J2/164 ,  B41J2/1642 ,  H01L21/321 ,  H01L21/32134 ,  B41J2202/03 ,  B41J2202/13

摘要： A method for producing a substrate for a recording head wherein a plurality of electro-thermal converting elements, a plurality of driving functional elements for respectively driving the electro-thermal converting elements and a plurality of wiring electrodes for respectively connecting each of the driving functional elements and each of the electro-thermal converting elements are formed on a supporting member by photolithography comprises forming the wiring electrodes by etching a material layer for the wiring electrodes while etchingwise removing a photoresist for masking the material layer for the wiring electrodes.

摘要翻译： 一种用于制造用于记录头的基板的方法，其中多个电热转换元件，用于分别驱动电热转换元件的多个驱动功能元件和用于分别连接每个驱动功能元件的多个布线电极 并且每个电热转换元件通过光刻形成在支撑构件上，包括通过蚀刻用于布线电极的材料层来形成布线电极，同时蚀刻去除用于掩蔽布线电极的材料层的光致抗蚀剂。

公开(公告)号：US07945873B2

公开(公告)日：2011-05-17

申请号：US12048691

申请日：2008-03-14

申请人： Kyouhei Watanabe ,  Masaki Kurihara ,  Hitoshi Shindo ,  Nobuhiko Sato ,  Yasuhiro Sekine ,  Masataka Ito

发明人： Kyouhei Watanabe ,  Masaki Kurihara ,  Hitoshi Shindo ,  Nobuhiko Sato ,  Yasuhiro Sekine ,  Masataka Ito

IPC分类号： G06F17/50

CPC分类号： G03F1/68 ,  G03F1/50 ,  G03F7/0005 ,  Y10T29/49

摘要： A method of generating mask pattern data of a photomask used to form microlenses divides a pattern formation surface of a mask pattern to be used for the photomask into a plurality of grid cells, acquires data that represent a transmitted light distribution of the mask pattern to be used for the photomask, determines whether to place a shield on each of the plurality of grid cells by binarizing the plurality of grid cells in order of increasing or decreasing distance from a center of the pattern formation surface using an error diffusion method, to acquire the transmitted light distribution, and generates mask pattern data that represent an arrangement of the shields, based on the determination.

摘要翻译： 产生用于形成微透镜的光掩模的掩模图案数据的方法将用于光掩模的掩模图案的图案形成表面划分成多个网格单元，获取表示掩模图案的透射光分布的数据为 用于光掩模的方法，通过使用误差扩散法从图案形成面的中心的距离增加或减小的次数二次化多个网格单元，确定是否对多个网格单元中的每一个放置屏蔽，以获取 透射光分布，并且基于该确定生成表示屏蔽的布置的掩模图案数据。