发明申请
- 专利标题： Extreme ultraviolet microscope
- 专利标题（中）： 极紫外线显微镜
-
申请号： US11790681申请日： 2007-04-26
-
公开(公告)号： US20080266654A1公开(公告)日： 2008-10-30
- 发明人: Vadim Yevgenyevich Banine , Arno Jan Bleeker , Vladimir Vitalevich Ivanov , Konstantin Nikolaevich Koshelev , Frank Jeroen Pieter Schuurmans , Vladimir Mihailovitch Krivtsun , Maarten Marinus Johannes Wilhelmus Van Herpen
- 申请人： Vadim Yevgenyevich Banine , Arno Jan Bleeker , Vladimir Vitalevich Ivanov , Konstantin Nikolaevich Koshelev , Frank Jeroen Pieter Schuurmans , Vladimir Mihailovitch Krivtsun , Maarten Marinus Johannes Wilhelmus Van Herpen
- 申请人地址： NL Veldhoven
- 专利权人： ASML NETHERLANDS B.V.
- 当前专利权人： ASML NETHERLANDS B.V.
- 当前专利权人地址： NL Veldhoven
- 主分类号： G02B21/00
- IPC分类号： G02B21/00
摘要：
An extreme ultraviolet (EUV) microscope configured to analyze a sample. The microscope includes a source of EUV radiation constructed and arranged to generate the EUV radiation with a wavelength at least in a range of about 2-6 nm, and an optical system constructed and arranged to illuminate the sample with the EUV radiation and to collect a radiation emanating from the sample. The optical system is arranged with at least one mirror that includes a multilayer structure for in-phase reflection of at least a portion of the radiation in the range of about 2-6 nm.
信息查询
