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    RADIATION SOURCE, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    2.
    发明申请
    RADIATION SOURCE, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 有权
    辐射源，光刻设备和器件制造方法

    公开(公告)号：US20110143288A1

    公开(公告)日：2011-06-16

    申请号：US13058788

    申请日：2009-07-13

    申请人： Antonius Theodorus Wilhelmus Kempen ,  Vadim Yevgenyevich Banine ,  Vladimir Vitalevich Ivanov ,  Erik Roelof Loopstra

    发明人： Antonius Theodorus Wilhelmus Kempen ,  Vadim Yevgenyevich Banine ,  Vladimir Vitalevich Ivanov ,  Erik Roelof Loopstra

    IPC分类号： G03F7/20 ,  G03B27/54

    CPC分类号： G03F7/2008 ,  G03F7/70575 ,  G03F7/70916 ,  G03F7/70925 ,  G03F7/70983 ,  G21K1/00

    摘要： A lithographic apparatus includes a source configured to generate a radiation beam comprising desired radiation and undesired radiation using a plasma, an illumination system configured to condition the radiation beam and to receive hydrogen gas during operation of the lithographic apparatus, and a support structure constructed to hold a patterning device. The patterning device is capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam. A substrate table is constructed to hold a substrate, and a projection system is configured to project the patterned radiation beam onto a target portion of the substrate. The lithographic apparatus is configured such that the radiation beam on entering the projection system includes at least 50% of the undesired radiation that is generated by the plasma and includes wavelengths of radiation that interact with the hydrogen gas to generate hydrogen radicals.

    摘要翻译： 光刻设备包括被配置为产生包含期望辐射和使用等离子体的不期望辐射的辐射束的源，被配置为调节辐射束并在光刻设备操作期间接收氢气的照明系统，以及构造成保持 图案形成装置。 图案形成装置能够在其横截面中赋予辐射束图案以形成图案化的辐射束。 衬底台被构造成保持衬底，并且投影系统被配置为将图案化的辐射束投影到衬底的目标部分上。 光刻设备被配置为使得进入投影系统的辐射束包括由等离子体产生的不期望辐射的至少50％，并且包括与氢气相互作用以产生氢自由基的辐射波长。

    Radiation source
    5.
    发明授权
    Radiation source 有权
    辐射源

    公开(公告)号：US07763871B2

    公开(公告)日：2010-07-27

    申请号：US12078663

    申请日：2008-04-02

    申请人： Vadim Yevgenyevich Banine ,  Vladimir Vitalevich Ivanov

    发明人： Vadim Yevgenyevich Banine ,  Vladimir Vitalevich Ivanov

    IPC分类号： A61N5/06

    CPC分类号： H05G2/003 ,  G03F7/70033 ,  G03F7/70175 ,  G03F7/70916 ,  H05G2/008

    摘要： A radiation source includes a chamber, a supply constructed and arranged to supply a substance to the chamber at a location that allows the substance to pass through an interaction point within the chamber, a laser constructed and arranged to provide a laser beam to the interaction point so that a radiation emitting plasma is produced when the laser beam interacts with the substance at the interaction point, and a conduit constructed and arranged to deliver a buffer gas into the chamber. The conduit has an outlet located adjacent to the interaction point.

    摘要翻译： 辐射源包括腔室，构造和布置成在物体通过腔室内的相互作用点的位置处将物质供应到腔室的供应源，构造和布置成将激光束提供到相互作用点的激光器 使得当激光束在相互作用点处与物质相互作用时产生辐射发射等离子体，以及构造并布置成将缓冲气体输送到室中的导管。 导管具有邻近相互作用点的出口。

    Lithographic apparatus and device manufacturing method
    6.
    发明申请
    Lithographic apparatus and device manufacturing method 失效
    平版印刷设备和器件制造方法

    公开(公告)号：US20090040491A1

    公开(公告)日：2009-02-12

    申请号：US11882853

    申请日：2007-08-06

    申请人： Vladimir Vitalevich Ivanov ,  Vadim Yevgenyevich Banine ,  Konstantin Nikolaevich Koshelev ,  Vladimir Mihailovitch Krivtsun

    发明人： Vladimir Vitalevich Ivanov ,  Vadim Yevgenyevich Banine ,  Konstantin Nikolaevich Koshelev ,  Vladimir Mihailovitch Krivtsun

    IPC分类号： G03B27/54 ,  H05G2/00

    CPC分类号： H05H1/24 ,  B82Y10/00 ,  G03F7/70033 ,  H05G2/003

    摘要： A lithographic system includes a source configured to generate a radiation, the source including a cathode and an anode, the cathode and the anode configured to create a discharge in a fuel located in a discharge space so as to generate a plasma, the discharge space including, in use, a substance configured to adjust radiation emission by the plasma so as to control a volume defined by the plasma; a pattern support configured to hold a patterning device, the patterning device configured to pattern the radiation to form a patterned beam of radiation; a substrate support configured to support a substrate; and a projection system configured to project the patterned beam of radiation onto the substrate.

    摘要翻译： 光刻系统包括被配置为产生辐射的源，所述源包括阴极和阳极，所述阴极和阳极被配置为在位于放电空间中的燃料中产生放电以产生等离子体，所述放电空间包括 在使用中，配置成调整等离子体的辐射发射以控制由等离子体限定的体积的物质; 配置为保持图案形成装置的图案支撑件，所述图案形成装置被配置为对所述辐射进行图案化以形成图案化的辐射束; 衬底支撑件，其构造成支撑衬底; 以及投影系统，被配置为将所述图案化的辐射束投射到所述基板上。

    Radiation source
    8.
    发明授权
    Radiation source 有权
    辐射源

    公开(公告)号：US09366967B2

    公开(公告)日：2016-06-14

    申请号：US14241364

    申请日：2012-08-01

    申请人： Andrei Mikhailovich Yakunin ,  Vladimir Vitalevich Ivanov ,  Vladimir Mihailovitch Krivtsun ,  Viacheslav Medvedev ,  Gerardus Hubertus Petrus Maria Swinkels ,  Jan Bernard Plechelmus Van Schoot

    发明人： Andrei Mikhailovich Yakunin ,  Vladimir Vitalevich Ivanov ,  Vladimir Mihailovitch Krivtsun ,  Viacheslav Medvedev ,  Gerardus Hubertus Petrus Maria Swinkels ,  Jan Bernard Plechelmus Van Schoot

    IPC分类号： G03B27/32 ,  G03B27/54 ,  G03F7/20 ,  H05G2/00

    CPC分类号： G03F7/70033 ,  H05G2/005 ,  H05G2/006 ,  H05G2/008

    摘要： A radiation source (60) suitable for providing a beam of radiation to an illuminator of a lithographic apparatus. The radiation source comprises a nozzle configured to direct a stream of fuel droplets (62) along a trajectory (64) towards a plasma formation location (66). The radiation source is configured to receive a first amount of radiation (68) such that the first amount of radiation is incident on a fuel droplet (62a) at the plasma formation location, and such that the first amount of radiation transfers energy into the fuel droplet to generate a modified fuel distribution (70), the modified fuel distribution having a surface. The radiation source is also configured to receive a second amount of radiation (72) such that the second amount of radiation is incident on a portion of the surface (70a) of the modified fuel distribution, the second amount of radiation having a p-polarized component with respect to the portion of the surface; and such that the second amount of radiation transfers energy to the modified fuel distribution to generate a radiation generating plasma, the radiation generating plasma emitting a third amount of radiation (74). The radiation source further comprises a collector (CO) configured to collect and direct at least a portion of the third amount of radiation. The radiation source is configured such that the second amount of radiation propagates in a first direction, the first direction being non-parallel to a normal to the portion of the surface of the modified fuel distribution.

    摘要翻译： 适于向光刻设备的照明器提供辐射束的辐射源（60）。 辐射源包括被配置为沿着轨迹（64）将燃料液滴（62）流引向等离子体形成位置（66）的喷嘴。 辐射源被配置为接收第一量的辐射（68），使得第一量的辐射入射在等离子体形成位置处的燃料液滴（62a）上，并且使得第一量的辐射将能量转移到燃料 液滴以产生改进的燃料分配（70），所述改进的燃料分布具有表面。 辐射源还被配置为接收第二数量的辐射（72），使得第二量的辐射入射在改性燃料分布的表面（70a）的一部分上，第二量的辐射具有p偏振 相对于表面的部分; 并且使得第二量的辐射将能量传递到经修改的燃料分布以产生辐射产生等离子体，该辐射产生等离子体发射第三量的辐射（74）。 辐射源还包括收集器（CO），其被配置成收集并引导第三量的辐射的至少一部分。 辐射源被配置成使得第二数量的辐射在第一方向上传播，第一方向不平行于改性燃料分布的表面部分的法线。