发明申请
- 专利标题： Non-stoichiometric SiOxNy optical filters
- 专利标题（中）： 非化学计量的SiOxNy光学滤光片
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申请号： US11789947申请日： 2007-04-26
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公开(公告)号： US20080266689A1公开(公告)日： 2008-10-30
- 发明人: Pooran Chandra Joshi , Apostolos T. Voutsas , John W. Hartzell
- 申请人： Pooran Chandra Joshi , Apostolos T. Voutsas , John W. Hartzell
- 专利权人： Sharp Laboratories of America, Inc.
- 当前专利权人： Sharp Laboratories of America, Inc.
- 主分类号： G02B5/22
- IPC分类号： G02B5/22 ; B32B19/00 ; B32B5/16
摘要：
A non-stoichiometric SiOXNY thin-film optical filter is provided. The filter is formed from a substrate and a first non-stoichiometric SiOX1NY1 thin-film overlying the substrate, where (X1+Y1 0). The first non-stoichiometric SiOX1NY1 thin-film has a refractive index (n1) in the range of about 1.46 to 3, and complex refractive index (N1=n1+ik1), where k1 is an extinction coefficient in a range of about 0 to 0.5. The first non-stoichiometric SiOX1NY1 thin-film may be either intrinsic or doped. In one aspect, the first non-stoichiometric SiOX1NY1 thin-film has nanoparticles with a size in the range of about 1 to 10 nm. A second non-stoichiometric SiOX2NY2 thin-film may overlie the first non-stoichiometric SiOX1NY1 thin-film, where Y1≠Y2. The second non-stoichiometric SiOX1NY1 thin-film may be intrinsic and doped. In another variation, a stoichiometric SiOX2NY2 thin-film, intrinsic or doped, overlies the first non-stoichiometric SiOX1NY1 thin-film.
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