发明申请
- 专利标题： Cleaning device and a lithographic apparatus cleaning method
- 专利标题（中）： 清洁装置和光刻设备清洁方法
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申请号： US11819959申请日： 2007-06-29
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公开(公告)号： US20080271747A1公开(公告)日： 2008-11-06
- 发明人: Anthonius Martinus Cornelis Petrus De Jong , Hans Jansen , Marco Koert Stavenga , Peter Franciscus Wanten , Bauke Jansen , Johannes Wilhelmus Jacobus Leonardus Cuijpers , Raymond Gerardus Marius Beeren , Kornelis Tijmen Hoekerd
- 申请人： Anthonius Martinus Cornelis Petrus De Jong , Hans Jansen , Marco Koert Stavenga , Peter Franciscus Wanten , Bauke Jansen , Johannes Wilhelmus Jacobus Leonardus Cuijpers , Raymond Gerardus Marius Beeren , Kornelis Tijmen Hoekerd
- 申请人地址： NL Veldhoven
- 专利权人： ASML NETHERLANDS B.V.
- 当前专利权人： ASML NETHERLANDS B.V.
- 当前专利权人地址： NL Veldhoven
- 主分类号： B08B3/12
- IPC分类号： B08B3/12
摘要：
A cleaning tool to clean a surface of a component of a lithographic apparatus is disclosed. The cleaning tool includes a sonic transducer, a liquid supply device configured to provide liquid to a reservoir between the surface to be cleaned and the sonic transducer, and a liquid outlet configured to remove liquid provided by the liquid supply device, the cleaning tool constructed and arranged such that, in use, liquid flows into the outlet under the influence of gravity.
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